摘要
采用无灯丝离子源结合非平衡磁控溅射的方法,在模具钢及单晶硅基体上制备了梯度过渡的掺钛类金刚石(Ti-DLC)膜层,利用俄歇电子谱(AES)、透射电镜(TEM)、X射线光电子能谱(XPS)及X射线衍射(XRD)等手段对膜层的过渡层、界面及微观结构进行研究。结果表明:制备的膜层成分深度分布与所设计的基体/Ti/TiN/TiCN/TiC/Ti-DLC相吻合,在梯度过渡中不同膜层之间界面体现为渐变过程,结合非常良好;少量的Ti主要以纳米晶TiC的形式掺入到非晶DLC膜当中;所制备的膜层具有厚2.9μm、硬度高达25.77 GPa、膜/基结合力44 N-74 N。
Ti-doped diamond-like carben（DLC） films were grown by non-filament ion beam source（IBS） and unbalanced magnetron sputtering on steel and silicon substrates. The microstructures and mechanical properties of the films were characterized with Anger electron spectroscopy（AES）, transmission electron microscopy（TEM）, X-ray photoelectron spectroscopy（XPS）, X-ray diffraction（XRD）, scratch tester and nano-indentation. The results show that the depth profile of the films agrees well with the design： Ti-DLC/TiC/TiCN/Ti/substrate and that a gradient transition was observed with strong interfacial adhesion at the interfaces of the different layers. Small amount of Ti, in the form of TiC nano-particles, was found to be doped into amorphous DLC layer. The surface hardness and interfacial adhesion of the 2.9 tan thick film were evaluated to be 25.77 GPa and 44 N- 74 N, respectively.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2007年第5期418-421,共4页
Chinese Journal of Vacuum Science and Technology
作者简介
联系人：Tel：（020）37239039，E-mail：lss7698@126．com
