摘要
采用中频非平衡磁控溅射沉积工艺,并施加霍尔离子源辅助沉积,在高速钢W18Cr4V及单晶硅基体上制备了梯度过渡的DLC/TiAlN复合薄膜。利用扫描电镜(SEM)、X射线光电子能谱仪(XPS)、显微硬度计、摩擦磨损仪等分析检测仪器对DLC/TiAlN复合薄膜的表面形貌、晶体结构、显微硬度、耐磨性等性能进行了检测分析。实验及分析结果表明:DLC/TiAlN薄膜平均膜厚为1.1μm,由于薄膜中的Al含量较多,使得复合薄膜的表面比DLC薄膜的表面要粗糙一些;通过对复合薄膜表层的XPS分析可知,ID/IG为2.63。由XPS深层剖析可知,DLC/TiAlN薄膜表层结构与DLC薄膜基本相同,里层则与TiAlN薄膜相似。在梯度过渡膜中,复合膜层之间的界面呈现为渐变过程,结合的非常好。DLC/TiAlN薄膜的显微硬度为2030 HV左右。与DLC薄膜显微硬度接近,低于TiAlN薄膜的显微硬度。但是DLC/TiAlN薄膜的耐磨性要好于TiAlN薄膜和DLC薄膜;DLC/TiAlN薄膜的耐腐蚀性能略好于DLC薄膜。
The diamond-like Carbon（DLC）/TiAlN composite films, with gradient transition layers, were grown by mid frequency magnetron sputtering and Hall ion source assisted deposition on high speed steel W18Cr4V and silicon substrates. Its microstructures and its mechanical properties were characterized with scanning electron microscopy （SEM）. Xray photoelectron spectroscopy （XPS） and conventional mechanical probes. The results show that the fairly smooth and compact DLC/TiAlN films, about 1 μm in thickness with strong interfacial adhesions, display good mechanical properties. For example, its micro-hardness is 2030 HV, close to that of the DLC films, but higher than that of TiAlN films on high speed steel substrate. When it comes to wear resistance, the DLC/TiAlN composite film is a little better than both DLC and TiAlN films. Moreover, it has higher corrosion resistance than the DLC films. The ID/IG was found to be 2.63. The XPS depth profiles show that the DLC/TiAlN surface structure resembles that of DLC and its inner layers mimics that of TiAlN films. Interesting finding is that high content of Al possibly roughens the surfaces of DLC/TiAlN films.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2008年第5期424-428,共5页
Chinese Journal of Vacuum Science and Technology
基金
国家863计划资助项目(No.2001AA338010)
关键词
TIALN薄膜
DLC薄膜
非平衡磁控溅射
中频溅射
等离子辅助沉积
TiAlN films； DLC films； Unbalanced magnetron sputtering； Medium frequency sputtering； Plasma ion assisted deposition
作者简介
联系人：Tel：13604020195；Email：zyc54@china．com
