摘要
采用加性 -显性遗传模型和统计分析方法 ,分析了水稻对 UV - B辐射增强的抗性遗传特点。结果表明 ,水稻对UV - B辐射增强主要性状抗性指标的遗传受加性和显性效应共同控制 ,其中以显性效应为主。除株高抗性指标不存在狭义遗传率外 ,各个抗性指标的狭义遗传率和广义遗传率均达显著水平。亲本 R6 6 9和密阳 4 6的 9个抗性指标具有明显的正向加性效应和显性效应值 ,可作为改良对 U V- B辐射增强抗性的理想亲本。进一步对主要性状抗性指标与对照的相应性状进行相关分析 ,认为应把植株较高、分蘖力强、根数多。
Genetic model for Additive Dominant and statistical analytic methods were used to analyze the inheritance of the resistance to enhanced UV B radiation in rice ( Oryza sativa L.). The result indicated that inheritance of the resistance to enhanced UV B radiation was controlled by both additive and dominant effects, but mainly by the dominant effect. The general heritabilities both in the narrow sense and in the broad sense for 8 resistant indices concerned were statistically significant with the exception of resistant index of plant height. According to the predicated genetic effects, the parents R669 and Miyang46 with significantly positive additive and dominant effects in resistant indices of 9 traits were considered elite parental lines to enhanced UV B radiation. Based on correlative analysis, higher plant height, stronger tillering ability, more plant roots and thinner leaves were considered desirably selected traits than other ones in the breeding for improving resistance of rice to enhanced UV B radiation effect.
出处
《作物学报》
CAS
CSCD
北大核心
2002年第5期686-692,共7页
Acta Agronomica Sinica
基金
国家自然科学基金项目 (3 9970 44 1)
教育部优秀年轻教师基金项目 (2 0 0 0 -11)
关键词
水稻
紫外线B
辐射
抗性
遗传分析
显效效应
加性效应
Rice ( Oryza sativa L.)
Ultraviolet B (UV B) radiation
Genetic analysis
Heritability
Dominant effect
Additive effect
