摘要
研究利用原子层沉积获得的小于10 nm Al_2O_3薄膜表面形貌特点。采用该技术获得4和8 nm的Al_2O_3薄膜,利用原子力扫描电镜(AFM)和扫描电镜(SEM)对薄膜表面形貌进行测量,通过最小二乘法和多重分形研究薄膜表面形貌,分析得出利用原子层沉积技术加工超薄Al_2O_3薄膜,其形貌与成膜原理有关,与厚度无关。
The surface morphology characteristics of Al2O3 film with thickness less than 10 nm fabricated by atomic layer deposition （ALD） were studied and 4 nm and 8 nm thick Al2O3 thin films were obtained by ALD. The surface morphology of the film was measured by atomic force microscopy （AFM） and scanning electron microscopy （SEM）. By the least squares method and multi-fractal, the surface morphology of film was studied. Results show that the film morphology has a correlation with the principle of generated films rather than the thickness.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2015年第12期3078-3082,共5页
Rare Metal Materials and Engineering
基金
国家自然科学基金资助(51175418
91323303)
新世纪优秀人才支持计划(93JXDW02000006)
"111"引智计划(B12016)
长江学者和创新团队发展计划(IRT1033)
中央高校基本科研业务费专项资金(xjj20100063
2011jdgz09
2011jdhz23
xjj2011068)
作者简介
作者简介：王琛英，女，1976年生，博士，西安交通大学机械制造系统工程重点实验室，陕西西安710049，E-mail：wangchenying@mail．xjtu.edu.cn
