摘要
本文阐述了新型的弧光辉光协同共放电真空镀膜机的设计思想及应用,叙述了镀膜机的整体结构、圆柱靶的设计和磁场模拟、工件篮的结构和辉光弧光共放电的原理。实验对比了辉光弧光共放电和单独的辉光放电、弧光放电在镀膜速度、膜层硬度和耐蚀性等方面的差别,表明了这种新型镀膜机的优越性。
A novel coating machine of arc discharge and glow discharge cement deposition was introduced. The design of the main structure of the coater, cylindrical magnetron ard special cage-like s＇ubstrate holder were described, as well as the working principle of APSCD, and the magnetic field modeling of cylindrical magnetron was discussed in detail. The studies on the deposition rate, hardness and corrosion resistance of films show that the APSCD has more advantages compared to arc plating and magnetron sputtering.
出处
《真空》
CAS
2013年第3期48-51,共4页
Vacuum
基金
黑龙江省自然科学基金(No.E010202)
深圳市科技研发资金(CYB20105270092A
JSD201105300103A)
关键词
镀膜机
圆柱靶
工件篮
coater
cylindrical magnetron
substrate holder
作者简介
林晶（1968-），女，山东省青岛市人，博士，教授。
