摘要
运用Monte Carlo方法对溅射过程进行了模拟计算,其结果清楚地描述了溅射的微观过程,溅射产额的计算值与实验值吻合。
This paper describes the computer simulation of sputter process on the binary collision model by the Monte Carlo method. The results show clearly the microscopic process of sputtering, and the calculation results of sputtering yield are in good agreement with those experiments.
出处
《天津大学学报》
EI
CAS
CSCD
1989年第2期107-112,共6页
Journal of Tianjin University(Science and Technology)
