摘要
传统的磁控溅射设备由于等离子体在靶面形成跑道效应,所以存在着靶材利用率低,反应溅射过程中稳定性差的问题。M.J.Thwaites提出了一种利用磁场将等离子体产生与溅射分开的结构,本文基于这种结构构造了一个实验平台对其进行了研究,实现了全靶腐蚀,提高了系统的稳定性。
Conventionally the target＇s service factor of magnetron sputtering device is low with poor stability in reactive sputtering process because the plasma causes a runway effect on target surface. Based on M. J. Thwaites＇s suggestion that a construction separates the generation of plasma from sputtering process by a magnetic field, an experimental platform is built to study his idea, thus fulfilling the full target erosion to improve the system stability.
出处
《真空》
CAS
北大核心
2007年第6期18-21,共4页
Vacuum
关键词
磁控溅射
全靶腐蚀
磁场模拟
magnetron sputtering
full target erosion
magnetic field simulation
作者简介
郝万顺（1982-），男，山西省太谷县人，硕士。
联系人：吴志明，教授、博导。
