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无氰滚镀低锡铜-锡合金工艺 被引量:3

Cyanide-free barrel plating of low-tin copper-tin alloy
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摘要 在前期研究的基础上,在Cu2P207.4H2020g/L、Sn2P2071g/L、K2HP04。3H2060g/L、pH=8.5、滚筒转速15r/min、滚镀时间1h、采用循环过滤的工艺条件下,通过正交试验研究了焦磷酸钾质量浓度、电流、温度和添加剂JZ-1的用量对低碳钢上无氰滚镀铜锡合金(低锡)镀层厚度和含锡量的影响,确定了最优的工艺条件,并探讨了滚镀电流、温度和时间对铜锡合金镀层的组成与镀速的影响。试验证明,当K4P207为300~350g/L、添加剂JZ-1为0.5mL/L、镀液温度为30~35℃、电流春度为0.38~0.48A/dm2时,可获得厚度5gm以上、锡含量为9%~11%的铜锡合金镀层,其外观光亮、金黄,与钢铁基体的结合力良好,具有一定的硬度与耐腐蚀性能,可以替代钢铁基材预镀镍和氰化预镀铜工艺。 Based on the previous works, the effects of mass concentration of potassium pyrophosphate, current, temperature, and dosage of JZ-1 additive on thickness and tin content of the cyanide-free barrel plated Cu-Sn alloy coating on low carbon steel substrate were studied by orthogonal test under the following conditions: CUEPEO7.4H20 20 g/L, SnEP2071 g/L, K2HPO4.3H20 60 g/L, pH 8.5, barrel rotation speed 15 r/min, plating time 1 h, and cycle filtration required. The optimal process conditions were determined, and the effects of plating current, temperature, and time on the composition and deposition rate of Cu-Sn coating were discussed. It is proved that a Cu-Sn alloy coating with at least 5 ~tm thickness and 9%-11% tin can be obtained with K4PzO7 300-350 g/L and JZ-1 additive 0.5 mL/L at temperature 30-35 ℃ and current density 0.38-0.48 A/dm2. The low-tin Cu-Sn alloy coating features a bright and golden appearance, good adhesion to the substrate, and favorable hardness and corrosion resistance, which is an alternative tonickel pre-plating and cyanide copper pre-plating on iron and steel substrates.
出处 《电镀与涂饰》 CAS CSCD 北大核心 2012年第10期15-18,共4页 Electroplating & Finishing
关键词 钢铁基体 铜—锡合金 无氰滚镀 焦磷酸盐 镀速 iron and steel substrate copper-tin alloy cyanide-free barrel plating pyrophosphate deposition rate
作者简介 冯冰(1987-),男,河南长葛人,在读硕士研究生,主要研究方向为应用电化学。 通信作者 曾振欧,教授,(E-mail)zhouzeng@scut.edu.cn。
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