摘要
聚焦离子束系统是微细加工和分析的主要技术之一,是一个完美的微米/纳米技术研究平台。简述了聚焦离子束系统的组成和主要功能,着重介绍了近年来该技术在离子束刻蚀、反应离子束刻蚀、离子束辅助沉积、离子注入、微区分析、掺杂和成像以及无掩膜曝光等微米/纳米加工领域的应用,并对未来的发展前景进行了简要分析。
The application of focused ion beam（FIB）technology in microfabrication has become increasngly popular. Its use in microfabrication has advantages over other micromachining technologies, such as small feature resolution,the ability to process without masks and being accommodating for variety of materials and geometries. In this paper, the application of FIB in microfahrieation and analysis technology are reviewed. After an introduction to the operating principles of FIB,the use of FIB for maskless micromachining is mainly described, such as etching, deposition, implantation,analysis,imagination and maskless lithography, as well as combination of FIB with other analysis equipments. Thereof, some examples of recent realizations are also given.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2006年第F11期40-43,46,共5页
Materials Reports
基金
中国工程物理研究院基金资助课题(课题编号:0344020)
关键词
聚焦离子束
刻蚀
沉积
离子注入
微区分析与加工
无掩膜曝光
FIB, etching, deposition, ion implantation, analysis and micromachining, maskless lithography
作者简介
张继成：男，1976年生，助理研究员，从事惯性约束聚变靶制备技术研究，Tel：0816—2488824，E-mail：zhangjccaep@126．com
