摘要
聚焦离子束技术是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程 于一身的新型微纳加工技术。它大大提高了微电子工业上材料、工艺、器件分析及修补的精度和速 度,目前已经成为微电子技术领域必不可少的关键技术之一。对聚焦离子束曝光技术作了介绍。
Focused Ion Beam is an advanced micro/nano technology for figure observation, orientation making-sample, component analysis, film deposition and maskless etching. It has improved precision and speed of material, technic and component＇s analysis and repair in micro-electronics industry greatly. So it has become a key technology in the field of micro-electronics technology. In this paper, Focused Ion Beam Lithography technology and is introduced.
出处
《电子工业专用设备》
2005年第12期56-58,共3页
Equipment for Electronic Products Manufacturing
关键词
聚焦离子束
液态金属离子源
曝光
Focused Ion Beam
Liquid Metal Ion Source
Lithography
作者简介
马向国（1975-）,男（满族）,内蒙古锡盟多伦人,博士生.主要从事微细加工技术及其深亚微米电子束、离子束曝光设备的研究.
