摘要
聚焦离子束技术(FIB)是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程于一身的新型微纳加工技术。几十年来,随着关键技术的不断突破和完善,达到了前所未有的发展,所突破的关键技术之一就是图形发生器的使用。
Focused Ion Beam is an advanced micro/nano technology for figure observation, orientation-making-sample, component analysis, film deposition and maskless etching. With the development and breakthrough of FIB key technology for many years, its technology has reach a high level. The one of these key technology is exact technology of pattern generator. In this paper, the pattern generators in focused ion beam equipment are introduced in detail.
出处
《电子工业专用设备》
2007年第9期25-29,共5页
Equipment for Electronic Products Manufacturing
关键词
聚焦离子束
图形发生器
微纳加工
Focused Ion Beam
Pattern Generator
Micro/Nano Fabrication-Technology
作者简介
马向国（1975-）,男（满族）,内蒙锡盟多伦人,博士生,博士期间从事纳米聚焦离子束系统液态金属离子源的研制工作.现为北京物资学院物流学院讲师.
