摘要
为了提高不锈钢的耐局部腐蚀性能,采用等离子体增强化学气相沉积(Plasma-enhanced chemical vapor deposition,PECVD)技术,在316L不锈钢表面制备含氢类金刚石(Diamond-like carbon,DLC)薄膜,研究不同脉冲偏压对薄膜的杂化结构及腐蚀行为的影响,并对相关影响机制进行讨论。结果表明,脉冲偏压主要影响316L不锈钢表面DLC薄膜的杂化结构及微观形貌,并最终影响其腐蚀行为。随着脉冲偏压的增加,等离子体电离程度增大,沉积过程中的热峰效应和溅射效应增强,DLC薄膜中的氢含量减少,降低了薄膜局部腐蚀敏感性,薄膜点蚀坑数量减少。但同时薄膜中sp^(2)杂化结构的相对含量会随脉冲偏压升高而增加,导致薄膜腐蚀速率加快,点蚀坑半径增大。随着偏压从1.4 kV增加到2.6 kV,316L不锈钢的年腐蚀速率由9.33 nm/y增大到62.4 nm/y。脉冲偏压为1.4 kV时,虽然年腐蚀速率最低,但薄膜最易发生点蚀,其长期服役寿命较差;而偏压为2.6 kV时,等离子体能量过高,薄膜被过度刻蚀,导致其缺陷增多,耐蚀性变差。在研究范围内,脉冲偏压为2200 V时,DLC薄膜具有较高的耐点蚀能力和较低的年腐蚀速率,表现出最佳的综合耐蚀性能。
In order to improve the localized corrosion resistance of stainless steel,plasma-enhanced chemical vapor deposition(PECVD)technology is used to prepare hydrogen-containing diamond-like carbon(DLC)film on the surface of 316L stainless steel.The effects of different pulsed bias on the hybrid structure and corrosion behavior of the film are investigated,and the related influence mechanisms are also discussed.The results are showed that pulse bias voltage mainly affects the hybrid structure and microstructure of the DLC film on 316L stainless steel surface,and finally the corrosion behavior is affected.With the increase of pulse bias voltage,the degree of plasma ionization increases,the thermal peak effect and sputtering effect during the deposition process are enhanced,the hydrogen content in the DLC film decreases,the local corrosion susceptibility of the film is reduced,and the number of pitting pits in the film is reduced.But at the same time,the relative content of sp^(2)hybrid structure in the film also increases with the increase of pulse bias voltage,which leads to the accelerated corrosion rate of the film and the increase of the pit radius.As the bias voltage increases from 1.4 kV to 2.6 kV,the annual corrosion rate of 316L stainless steel increases from 9.33 nm/y to 62.4 nm/y.When the pulse bias voltage is 1.4 kV,although the annual corrosion rate is the lowest,the film is most prone to pitting corrosion,and its long-term service life is poor.When the bias voltage is 2.6 kV,the plasma energy is too high,and the thin film is etched excessively,resulting in increased defects and poor corrosion resistance.In the research range,when the pulse bias voltage is 2.2 kV,the DLC film has high pitting corrosion resistance and low annual corrosion rate,showing the best comprehensive corrosion resistance.
作者
陈东旭
郭阳阳
祁继隆
周艳文
CHEN Dongxu;GUO Yangyang;QI Jilong;ZHOU Yanwen(School of Materials and Metallurgy,University of Science and Technology Liaoning,Anshan 114000,China)
出处
《中国表面工程》
EI
CAS
CSCD
北大核心
2022年第5期272-278,共7页
China Surface Engineering
基金
国家自然科学基金(51972155)
辽宁省教育厅基金(LJKZ0286)资助项目
关键词
等离子体
脉冲偏压
化学气相沉积
类金刚石薄膜
腐蚀行为
plasma
pulsed bias
chemical vapor deposition
diamond-like carbon film
corrosion behavior
作者简介
陈东旭,男,1984年出生,博士,讲师,硕士研究生导师。主要研究方向为材料表面改性层的腐蚀与防护。E-mail:dxchen11b@alum.imr.ac.cn;通信作者:周艳文,女,1966年出生,博士,教授,博士研究生导师。主要研究方向为等离子体物理。E-mail:zhouyanwen1966@163.com
