期刊文献+

皮秒激光脉冲串对单晶硅切割质量影响 被引量:1

The Influence of Picosecond Laser Pulse Burst on the Cutting Quality of Single Crystal Silicon
在线阅读 下载PDF
导出
摘要 利用紫外皮秒激光器脉冲串模式对单晶硅材料进行切割测试研究,分析了不同子脉冲数量情况下单脉冲能量变化对热影响区大小、表面形貌效果、切缝宽度以及切割深度的影响。研究结果表明,脉冲串模式可以有效地降低热影响区,减少重熔层的产生。随着单脉冲能量的增加,脉冲串相比于单脉冲模式产生的热影区差值逐步增大,由增加脉冲串子脉冲数量而导致的热影响区减小效应愈加明显。当脉冲串中子脉冲数量为3或者5,脉冲能量为8μJ时产生的热影响区和表面形貌效果与单脉冲模式下脉冲能量为2μJ的效果基本一致,并且切割深度是单脉冲模式切割深度的2倍。 The UV picosecond laser burst mode was used to conduct cutting tests on single crystal silicon materials,and the effects of single pulse energy changes on the size of the heat-affected zone,surface topography,cutting width and cutting depth under different sub-pulses were analyzed.The results show that the burst mode can effectively reduce the heat affected zone and reduce the generation of remelted layers.With the increase of the single pulse energy,The difference between the heat affected zone produced by burst mode and that generated by single pulse mode increases gradually.And the decrease effect of the heat affected zone caused by the increase of the number of sub pulses in the burst mode becomes more obvious.When the number of neutron pulses in the burst mode is 3 or 5,and the pulse energy is 8μJ,the heat affected zone and surface morphology is basically the same as that of single pulse mode when the pulse energy is 2μJ,and the cutting depth is 2 times of that in the single pulse mode.
作者 汪于涛 袁山山 骆公序 李文兵 王丽 陈亮 沈佳骏 Wang Yutao;Yuan Shanshan;Luo Gongxu;Li Wenbing;Wang Li;Chen Liang;Shen Jiajun(Shanghai Keylab of Laser Beam Micro Processing,Shanghai Institute of Laser Technology,Shanghai 200233,China)
出处 《应用激光》 CSCD 北大核心 2020年第5期878-883,共6页 Applied Laser
基金 上海市科委项目(项目编号:19511130402)
关键词 脉冲串 单晶硅 热影响区 表面形貌 burst mode single-crystal silicon heat affected zone surface morphology
作者简介 汪于涛(1992-),男,硕士,工程师,主要从事激光与材料相互作用的研究。E-mail:fandy459091542@163.com
  • 相关文献

参考文献6

二级参考文献83

  • 1D. Renshaw, P.B. Denyer, M. Lu et al.. A single-chip video camera with on-chip automatic exposure control[C]. Proc.ISIC- 91, Singapore, 1991:346-349.
  • 2P.B. Denyer, D. Renshaw, G. Wang et al.. CMOS image sensors for multimedia applications[C]. Proc.IEEE CICC 93, San Diego, 1993.
  • 3Pierre Magnan. Detection of visible photons in CCD and CMOS: a comparative view[J]. Nuclear Instruments and Methods in Physics Research A, 2003, 504:199-212.
  • 4P. Seitz. Solid-State Image Sensing[M]. New York: Academic Press, 2000,165-222.
  • 5E1 Gamal A., Eltoukhy H.. CMOS image sensors[J]. Circuits and Devices Magazine, IEEE, 2005,21(3): 6-20.
  • 6Modha K. N., Stockford I. M., Light R etal.. A custom CMOS sensor for pyramidal adaptive optics system[C]. IEEE Mixed-Signals, Sensors, and 'Systems Test Workshop, Vancouver, 2008:1-4.
  • 7K.Yoon, C.Kim, B. Lee et al.. Single-chip CMOS image sensor for mobile application[J]. IEEE Journal of Solid-State Circuits, 2002,37(2): 1839-1845.
  • 8M. Hilleb rand, N. Stevanovic, B. Hosticka et al.. High speed camera system using a CMOS image sens or [C]. Proceedings of the IEEE Intelligent Vehicles Symposium, 2000,656-661.
  • 9Sugiyama Y., Takumi M., Toyoda H. et al.. A high-speed CMOS image sensor with profile data acquiring function[J]. IEEE Journal of Solid-State Circuits, 2005, 40(12): 2816-2823.
  • 10Dubois J., Ginhac D., Paindavoine M. et al.. A 10000 fps CMOS sensor with massively parallel image processing[J]. IEEE Journal of Solid-State Circuits, 2008, 43(3): 706-717.

共引文献67

同被引文献7

引证文献1

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部