摘要
表面活性剂以其特有的降低表面张力特性、分散悬浮及润湿渗透作用在微电子工业中应用越来越广泛,尤其是在硅材料的切片、磨片、抛光及清洗工艺中的应用已成为减少损伤、缺陷和污染的必不可少的辅助材料.本文主要对表面活性剂的作用机理及对硅表面性能的影响进行分析讨论.
The application of surfactant in microelectronics, especially in silicon slicing, grinding, polishing and cleaning, is becoming widely, because it can reduce surface tension, dispersing, suspension and osmosis. The surfactant is becoming necessarily assistant material to decrease damage, defect and contamination. This paper analyses effect mechanism and influence on silicon performance of the surfactant.
出处
《河北工业大学学报》
CAS
2004年第2期72-76,共5页
Journal of Hebei University of Technology
关键词
硅片
表面活性剂
渗透
分散
清洗
silicon wafer
surfactant
osmosis
dispersion
cleaning
