摘要
用紫外 -可见光谱仪研究了不同溅射功率下磁控溅射法在玻璃基上沉积掺氮二氧化钛膜的沉积速率和光学带隙。结果表明 ,随着溅射功率的增加 ,薄膜的沉积速率增加 ,吸收边波长红移 ,薄膜的光学带隙宽度减小。热处理温度对不掺氮二氧化钛薄膜的吸收边和光学带隙的影响较小。
The deposition rate and optical band gap of N doped TiO 2 film deposited on glass matrix by magnetron sputtering were researched under different sputtering power using UV Vis spectroscopy. The results show that, with the increase of sputtering power, the deposition rate increased, a red shift of wavelength appear ed at the absorption edge and the optical band gap decreased. The influeuce of annealing temperature is comparatively small on the absorption edge and optical band gap of TiO 2 film.
出处
《分析仪器》
CAS
2003年第4期20-22,共3页
Analytical Instrumentation
基金
湖北省自然科学基金资助项目 (2 0 0 1abb0 77)
