摘要
针对等离子体浸没式离子注入(PIII)过程中,无法对实际注入目标基板的离子剂量进行检测和显示的问题,设计了一套基于PIII设备的离子剂量检测装置。该装置围绕注入基板放置离子检测装置,等离子体注入过程中,通过信号调理电路和LabVIEW数据采集卡对检测信号进行分析处理,以实现等离子体注入剂量的实时监测。实验结果表明,基于PIII设备的离子剂量检测装置能够有效收集等离子体进行检测,检测结果可以为腔室结构优化和注入工艺改良提供参考依据。
In order to solve the problem that the ion dose actually injected into the target substrate cannot be detected and displayed during plasma immersion ion implantation(PIII),a set of ion dose detection device based on PII equipment is designed.The device places an ion detection device around the injection substrate.During the plasma injection process,the detection signal is analyzed and processed through a signal conditioning circuit and a LabVIEW data acquisition card to achieve real-time monitoring of plasma injection dose.The experimental results indicate that the ion dose detection device based on PIII equipment can effectively collect plasma for detection,and the detection results can provide reference basis for chamber structure optimization and injection process improvement.
作者
王兴
周临震
WANG Xing;ZHOU Linzhen(School of Mechanical Engineering,Yancheng Institute of Technology,Yancheng Jiangsu 224051,China)
出处
《盐城工学院学报（自然科学版）》
CAS
2023年第2期67-71,共5页
Journal of Yancheng Institute of Technology:Natural Science Edition
作者简介
王兴(1996-),男,河北邢台人,硕士生,主要研究方向为等离子体浸没式注入设备和等离子体注入工艺;通信作者:周临震(1976-),男,江苏东台人,教授,博士,主要研究方向为机械设计与制造。
