摘要
采用土培和砂培方法,等养分条件下探讨了加硅对香蕉幼苗生长与氮、磷、钾吸收分配的影响。结果表明,加硅对香蕉地上部分、根系的生长、氮、磷、钾的吸收与分配的影响与供硅水平密切相关,对根系的影响高于对地上部分的影响。砂培供硅(SiO_2,下同)低于256 mg L^(-1)促进根系生长,对地上部分生长及地上部分钾含量影响不显著;土培加硅0.5 g kg^(-1)和0.8g kg^(-1)显著地降低地上部分生物量及氮含量,提高根系中氮含量,根系氮含量/地上部分氮含量分别比对照提高64.1%和35.9%;砂培加硅256 mg L^(-1)显著提高地上部分磷含量,土培供硅0.5 g kg^(-1)根系中磷含量以及磷在根系/地上部分比例显著提高;与不加硅相比加硅显著提高根系钾/地上部分钾的比例;随供硅水平的提高地上部分硅含量显著提高,根系硅/地上部分硅的比例显著提高,与不加硅相比,供低水平硅降低香蕉地上部分硅的含量。
This research explored that the effect of four silicon（Si） added levels on the growth of seedling and its nutrients allocation characteristics of nitrogen（N）,phosphorus（P） and potassium（K） in banana with sand and soil culture experiments.The results showed that biomass of shoot and root,and the concentration of N,P and K in banana were closely related to Si level,and Si addition had more evident impact on root than on shoot.Root biomass increased significantly under Si level（SiO_2,the same as follow） 256 mg L^-1,but there were no significant effect on the biomass and K concentration of banana shoot in sand culture experiment.N concentration in shoot decreased evidently under the Si added treatments of 0.5 g kg^-1 soil and 0.8 g kg^-1 soil but increased in root,and the ratio of N concentration in shoot to root increased by 64.1% and 35.9% compared with control treatment.P concentration in shoot increased distinctly under Si adding 256 mg L^-1 in sand culture experiment.P concentration in root,ratio of P concentration in root to shoot increased markedly under Si adding 0.5 g kg^-1 soil.And the ratio of K concentration had the same change trend as that of P at all Si adding levels.Si concentration of shoot and its ratio of root to shoot showed significant linear relationship with Si supplying level,but it decreased under Si supplying 0.2 g kg^-1 soil compared with no Si adding treatment.
出处
《土壤通报》
CAS
北大核心
2017年第6期1457-1461,共5页
Chinese Journal of Soil Science
基金
海南省自然基金项目(项目编号:20153052)资助
关键词
香蕉幼苗
硅
生长
氮磷钾
Banana seedling
Silicon
Growth
Nitrogen
phosphorus and potassium
作者简介
常春荣（1969-），女，副教授，主要从事植物营养学生理与分子研究。E—mail：hhnccr@126．com
