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磁控溅射法制备Al_xCoCrFeNi高熵合金薄膜的微观组织和力学性能研究 被引量:17

Study on microstructure and mechanical properties of Al_xCoCrFeNi high entropy alloy thin films prepared by magnetron sputtering
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摘要 利用磁控溅射工艺制备了不同Al含量的(0~20%(原子分数))AlCoCrFeNi高熵合金薄膜,研究了Al含量对AlCoCrFeNi高熵合金薄膜微观结构和力学性能的影响。结果表明,Al元素的加入,使得原CoCrFeNi四元合金薄膜中的(200)峰消失,Al_xCoCrFeNi薄膜呈现出(111)晶面的择优生长取向。Al_xCoCrFeNi合金薄膜形成了面心立方单一均匀的固溶体。Al元素的加入起到了固溶强化的作用,使Al_xCoCrFeNi薄膜硬度相对于CoCrFeNi合金薄膜整体提高了1~2GPa。当Al含量为0.8时,薄膜的柱状晶宽度达到最小,Al_(0.8)CoCrFeNi薄膜在Hall-Petch关系作用下硬度显著增加,达到最大值18.7GPa。 The Al_xCoCrFeNi high entropy alloy films with different Al contents(x=0-20at%)were prepared by DC magnetron sputtering technique in this paper.The effect of Al content on the microstructure and mechanical properties of Al_xCoCrFeNi high entropy alloy films was investigated.The results show that the addition of Al element weakens(200)diffraction peak,and the AlxCoCrFeNi film is consisted of a uniform fcc-structured solid solution with a(111)preferential growth orientation.Due to the solid solution strengthening effect,the hardness of Al_xCoCrFeNi film is 1-2 GPa higher than that of CoCrFeNi film.When the Al content is 0.8,the AlxCoCrFeNi film presents the finest columnar crystals.Under the strengthening effect of the Hall-Petch relationship,the hardness of AlxCoCrFeNi film remarkably improves with the maximum value of 18.7GPa.
出处 《功能材料》 EI CAS CSCD 北大核心 2017年第6期6144-6148,共5页 Journal of Functional Materials
基金 国家自然科学基金资助项目(51471110)
关键词 AlxCoCrFeNi高熵合金薄膜 微观组织 力学性能 磁控溅射 AlxCoCrFeNi high entropy alloy films microstructure mechanical properties magnetron sputtering
作者简介 黄纯可(1993-),女,湖北十堰人,在读硕士,师承李伟副教授,从事功能薄膜方向的研究。
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