摘要
通过等离子体增强化学气相沉积法(PECVD)制备粒径大小可以控制的硅纳米晶体,并对制备的纳米晶硅进行了在线表面改性.实验结果表明:成功获得了表面经烃基改性的不同粒径的纳米晶硅.相较于没有改性的纳米晶硅,它具有良好的抗氧化性和抗团簇能力,在有机溶剂中有着很好的分散性.
Utilizing plasma-enhanced chemical vapor deposition（PECVD） approaches, the synthesis and in-flight passivaton of size-controllable Si nanoctystals were presented. The results showed that different size silicon nanocrystals were successfully grafted with 1-alkenes. Compared with unfunctionalized silicon particles, they were hydrophobic and had higher oxidation resistance, kinetic stability, which could form a stable dispersion in organic solvents.
出处
《西南民族大学学报（自然科学版）》
CAS
2014年第6期928-934,共7页
Journal of Southwest Minzu University(Natural Science Edition)
基金
国家高技术研究发展计划(863计划)资助项目(2011AA050515)
关键词
纳米晶硅
PECVD
制备
表面改性
silicon nanocrystals
PECVD
synthesis
surface functionalization
作者简介
张珈铭（1990-）,男,汉族,四川汉源人,硕士研究生,研究方向：新能源材料研究.
张静全（1970-）,男,教授,博士,研究方向：半导体光电材料及器件应用.
