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磁控共溅射Al-Pb合金薄膜中固溶度的扩展 被引量:1

Extended Solubility in Al-Pb Alloy Thin Films Deposited by Magnetron Co-sputtering
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摘要 利用磁控共溅射法在液氮冷却的衬底(LNCs)上制备了Al-Pb合金薄膜,运用EDX、XRD、TEM和SEM对薄膜成分、结构及形貌进行了研究。结果表明,Al-Pb薄膜在Pb含量为7.38%~2.73%(原子分数,下同)的宽范围内,均存在Al在Pb中的fccPb(Al)亚稳过饱和置换固溶体,固溶度与膜成分相关,随薄膜Pb含量的变化,固溶度在3.03%~5.31%Al之间变化,Al-48.9%Pb膜扩展固溶度最大(5.31%Al),薄膜Pb含量降低或升高时,fccPb(Al)固溶体的固溶度下降。此结果与Miedema理论计算的Al-Pb系混合焓随Pb含量的变化趋势相似。低温衬底下Pb的体扩散弱化并导致相分离倾向降低是固溶延展的动力学原因。 The component, structure and surface morphology of Al-Pb alloy thin films fabricated by magnetron co-sputtering technique on liquid-nitrogen-cooled substrates are investigated by EDX, XRD, TEM and SEM. The resuits show that the presence of fcc Pb(Al) metastable supersaturated substitutional Al in fcc-Pb lattice solid solution in AI-Pb thin films with Pb of 7. 38at%0-92. 73at%. The value of solubility vary from 3.03at% to 5. 31at% with the Pb concentration changes in AI-Pb thin films. The maximum fce Pb(Al) solubility is about 5.31at% for A1-48. 9at% Pb thin films, and lower or higher Pb content will decrease the solubility. This results are similar to the variation trend of Al-Pb mixture enthalpy with Pb content calculated by Miedema theory. It is considered that the extended solubility can be attributed to a kinetic cause, i. e. , the Pb bulk diffusion is weaken and hence the tendency of phase separation decreases under cooled substrates condition.
出处 《材料导报》 EI CAS CSCD 北大核心 2010年第10期10-13,共4页 Materials Reports
基金 云南省自然科学基金重点资助项目(2004E0004Z) 云南省自然科学基金资助项目(2006E0018Q)
关键词 Al—Pb合金薄膜 亚稳固溶体 扩展固溶度 磁控共溅射 Al-Pb alloy thin films, metastable solid solution, extended solubility, magnetron co-sputtering
作者简介 郭中正:男,1983年生,博士生,主要研究方向为金属薄膜材料的结构与性能Tel:0871-5136698E-mail:1982gzz@163.com 孙勇:通讯作者,教授,博导Tel:0871-5334093E-mail:xbysun@sina.com
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