摘要
依据化学机械抛光(Chemical Mechanical Polishing,CMP)加工玻璃光学元件的原理,通过对抛光运动机理的理论分析,提出了抛光垫的磨削均匀性对光学元件面形的影响,并设计了新的工艺流程.通过工艺试验,完成了高准确度玻璃光学元件的CMP加工,获得了表面质量N<0.2,Rq<0.3nm的玻璃光学元件.
Based on chemical mechanical polishing （CMP） elements for galss optical components, the characteristic of polishing motion was researched by theoretic analysis of polishing motion mechanism during optical components CMP process and the influence of the pad material removal uniformity on the surface planarity of optical components was discussed specially. A new process was designed too. The high precision glass optical components with N〈0. 2 and Rq〈0. 3nm were obtained in CMP process firstly.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2008年第12期2499-2503,共5页
Acta Photonica Sinica
关键词
玻璃光学原件
超光滑表面
化学机械抛光
抛光垫
运动机理分析
Galss optical components
Super-smooth surface
Chemical mechanical polishing （CMP）
Polishing pad
Motion mechanism anaylysis
作者简介
CHEN Yong Instrument, Engineering was born in 1961. Tsinghua University , Beijing Institute of He received the B. S. degree from Department of Precision and the M. S. degree from Department of Photoelectric Technology. Now he is a professor at FACRI （Flight Automatic Control Research Institute） and pursuing the Ph. D. degree at Northwestern Polytechnical University. His research interests focus on laser application, especially laser gyro,inertial navigation sensor and technology.Tel：029-88399942 Email：guangxb@facri．com
