摘要
本文阐述一种由叠加电场原理设计的DJK-M脉冲电源用于镀镍的实验室试验结果.结果表明,脉冲电镀的沉积效率较直流电镀的高,采用DJK-M电源的叠加脉冲电镀更显著;添加剂含量相同的光亮镀镍液中,脉冲电镀所得镀层的光亮性好.结果还表明,脉冲电镀时的脉冲参数选择适当,可减少添加剂或光亮剂的用量而不影响镀层的光亮性.
The experimental results of the electrodeposition of nickel using DJK-M pulse power which is designed according to the principle of field superposition method were presented in this paper. The experimental results show that with the rectangular wave superposition pulse plating process the nickel deposit obtained is brighter and with higher current efficiency compared with those obtained with the direct current plating and the rectangular wave pulse plating processes. If the pulse parameters are proper selected the brightener concentration in the bath can be reduced and the brightness of the deposit will not be decreased.
出处
《电镀与精饰》
CAS
1990年第3期3-8,共6页
Plating & Finishing
