摘要
我们用射频辉光放电分解（ＣＨ４＋ＳｉＨ４）在单晶硅和玻璃衬底上制造非晶碳硅合金膜。通过红外吸收、光吸收、暗电导率和光电导率的测量给出了化学组分、光学带隙、红外光谱、暗电导率、光电导率、掺硼的影响和退火特性。
Abstract Hydrogenated amorphous Silicon-Carbon alloy film has been prepared on C-Si and glass substrate by radio-frequency glowdischarge decomposition of a Silane-methane. It's various properity, including the chemical composition,optical gap, infrared spectrum, dark and photo conductivity, boron doping effect and heat-treatment by means of infrared absorption, optical absorption,and conductivity measure.
出处
《真空》
CAS
北大核心
1994年第1期25-28,共4页
Vacuum
