摘要
作者及其同事们经过 2 0多年努力将计量光栅技术提高到了纳米量级和亚纳米量级 ,并进行了大面积推广应用 ,形成了一整套纳米光栅测量技术 ,该文为对这套技术的综合论述 .首先回顾了刻线技术的发展历史 ,指出中国古代曾作出杰出贡献 .归纳了发展计量光栅技术的 5个阶段和 4项内容 .给出纳米光栅的定义和两个特点 ,并通过作者和同事们的光栅制造过程说明 ,纳米光栅实质上是一种刻录、固化到光栅基体上的光波波长 .它为纳米测量领域提供了一种新途径、新方法 ,与激光干涉仪等现有纳米测量方法相比 ,具有自己独特的优点 .文中讨论了纳米光栅的读取技术与信号处理技术 ,提出了纳米光栅细分误差的错位测量法 .还讨论了与纳米光栅相关的纳米机械 ,介绍了作者和同事们的科研成果 ,圆柱、导轨等的机械精度已经进入了纳米量级 .
Metrological gratings technology has been enhanced to the level of nanometer and subnanometer by the author and his collegues during the past two decades.This set of technology is discussed synthetically.The paper sums up the five stages and four contents that we have worked on the field of metrological gratings near a half of century. The definition and distinguishing features of nano gratings have been given. Nano gratings is essentially a kind of optical wave length engraved and solidified to grating base, and it provides a new way and method for nanometer measurement. To compare with laser interferometer, it has several strong points, such as, not sensitive to air refractive index, and therefore, not sensitive to atmosphere pressure and air humidity, as well as some compensation function to temperature change.The paper discusses reading and signal processing of nano gratings and advances the dislocation method for measurement of interpolation error on the level of nanometer. Some precision mechanisms have been raised to the level of nanometer. Finally, results to compare with laser interferometer and gauge blocks have been given.
出处
《纳米技术与精密工程》
CAS
CSCD
2004年第1期8-15,共8页
Nanotechnology and Precision Engineering
关键词
纳米计量光栅
纳米测量
莫尔条纹
细分误差
纳米机械
nano metrological grating
nanometer measurement
moiré fringe
interpolation error
nanometer machinery
