The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputter...The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputtering.The micro-structure,adhesive and electrical properties of the thin films were investigated by using scanning electron microscopy,scratch method and four-probe method.The burst voltage and current of the thin film transducers with different substrates were measured according to D-optimization method.The results show that the particle size,structural defect,resistivity and adhesion strength of the thin film increase with the increase of the substrate roughness.The difference among the burst time of the samples with difference substrate roughness gradually decreases with the increase of stimulation amount.The burst time is approximate to 20 μs in the charging voltage of 37 V.展开更多
The activated chemisorption of N<sub>2</sub> on Ni （poly） and La film was performed on a molecular beam—surface scattering apparatus. Experimental results indicate that the initial sticking probability ...The activated chemisorption of N<sub>2</sub> on Ni （poly） and La film was performed on a molecular beam—surface scattering apparatus. Experimental results indicate that the initial sticking probability s<sub>o</sub> increases linearly from 0 to 0.03 as normal component of translational energy of the molecuar beam E<sub>n</sub> increases from 11.00 to 19.91 kcal/mol for N<sub>2</sub>/Ni system and S<sub>0</sub> from 0 to 0. 10 as E<sub>n</sub> from 10. 40 to 19.91 kcal/mol for N<sub>2</sub>/La system. The apparent activation energy △E are 6.16 kcal/mol and 5.30 kcal/mol for N<sub>2</sub>/Ni and N<sub>2</sub>/La systems respectively.展开更多
由单一还原剂 NaH_2PO_2或 NaH_2PO_3与 KBH_4的复合还原剂分别在类镍溶液中获得 Ni-Fe-P 以及 Ni-Fe-P-B 合金膜,研究了这些新型合金膜的磁性。结果发现,铁磁性元素 Fe 含量增加导致原子平均磁矩及饱和磁化强度 Ms 增大;结构为非晶态...由单一还原剂 NaH_2PO_2或 NaH_2PO_3与 KBH_4的复合还原剂分别在类镍溶液中获得 Ni-Fe-P 以及 Ni-Fe-P-B 合金膜,研究了这些新型合金膜的磁性。结果发现,铁磁性元素 Fe 含量增加导致原子平均磁矩及饱和磁化强度 Ms 增大;结构为非晶态的合金膜具有较优的矫顽力 Hc 值;合金膜磁滞回线出现较低的矩形比说明化学镀制备态样品不够均匀;热处理温度高于400℃后,合金膜的饱和磁化强度连续减小,矫顽力急剧增大;同时,镀层的均匀性明显得到改善。展开更多
文摘The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputtering.The micro-structure,adhesive and electrical properties of the thin films were investigated by using scanning electron microscopy,scratch method and four-probe method.The burst voltage and current of the thin film transducers with different substrates were measured according to D-optimization method.The results show that the particle size,structural defect,resistivity and adhesion strength of the thin film increase with the increase of the substrate roughness.The difference among the burst time of the samples with difference substrate roughness gradually decreases with the increase of stimulation amount.The burst time is approximate to 20 μs in the charging voltage of 37 V.
基金Project supportec by the National Natural Science Foundation of China
文摘The activated chemisorption of N<sub>2</sub> on Ni （poly） and La film was performed on a molecular beam—surface scattering apparatus. Experimental results indicate that the initial sticking probability s<sub>o</sub> increases linearly from 0 to 0.03 as normal component of translational energy of the molecuar beam E<sub>n</sub> increases from 11.00 to 19.91 kcal/mol for N<sub>2</sub>/Ni system and S<sub>0</sub> from 0 to 0. 10 as E<sub>n</sub> from 10. 40 to 19.91 kcal/mol for N<sub>2</sub>/La system. The apparent activation energy △E are 6.16 kcal/mol and 5.30 kcal/mol for N<sub>2</sub>/Ni and N<sub>2</sub>/La systems respectively.
文摘由单一还原剂 NaH_2PO_2或 NaH_2PO_3与 KBH_4的复合还原剂分别在类镍溶液中获得 Ni-Fe-P 以及 Ni-Fe-P-B 合金膜,研究了这些新型合金膜的磁性。结果发现,铁磁性元素 Fe 含量增加导致原子平均磁矩及饱和磁化强度 Ms 增大;结构为非晶态的合金膜具有较优的矫顽力 Hc 值;合金膜磁滞回线出现较低的矩形比说明化学镀制备态样品不够均匀;热处理温度高于400℃后,合金膜的饱和磁化强度连续减小,矫顽力急剧增大;同时,镀层的均匀性明显得到改善。
文摘用电化学方法制备Ag3PO4/Ni薄膜,以扫描电子显微镜(SEM)、X射线衍射(XRD)和紫外-可见漫反射光谱(UV-Vis DRS)对薄膜的表面形貌、晶相结构、光谱特性及能带结构进行了表征,以罗丹明B为模拟污染物对薄膜的光催化活性和稳定性进行了测定,采用向溶液中加入活性物种捕获剂的方法对薄膜光催化降解机理进行了探索。结果表明:最佳工艺下制备的Ag3PO4/Ni薄膜具有致密的层状表面结构,是由多晶纳米颗粒构成的薄膜。薄膜具有较高的光催化活性和突出的光催化稳定性,可见光下催化作用60 min,薄膜光催化罗丹明B的降解率是多孔P25 Ti O2/ITO纳米薄膜(自制)的2.3倍;在保持薄膜光催化活性基本不变的前提下可循环使用6次。给出了可见光下薄膜光催化降解罗丹明B的反应机理。
