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ESCRT Mechanism-mediated Repair of Plasma Membrane Damage Induced by Regulatory Cell Death
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作者 FENG Tian-Yang DENG Le +2 位作者 XU Gou LI Li GUO Miao-Miao 《生物化学与生物物理进展》 北大核心 2025年第5期1099-1112,共14页
The plasma membrane(PM)plays an essential role in maintaining cell homeostasis,therefore,timely and effective repair of damage caused by factors such as mechanical rupture,pore-forming toxins,or pore-forming proteins ... The plasma membrane(PM)plays an essential role in maintaining cell homeostasis,therefore,timely and effective repair of damage caused by factors such as mechanical rupture,pore-forming toxins,or pore-forming proteins is crucial for cell survival.PM damage induces membrane rupture and stimulates an immune response.However,damage resulting from regulated cell death processes,including pyroptosis,ferroptosis,and necroptosis,cannot be repaired by simple sealing mechanisms and thus,requires specialized repair machinery.Recent research has identified a PM repair mechanism of regulated cell death-related injury,mediated by the endosomal sorting complexes required for transport(ESCRT)machinery.Here,we review recent progress in elucidating the ESCRT machinery-mediated repair mechanism of PM injury,with particular focus on processes related to regulated cell death.This overview,along with continued research in this field,may provide novel insights into therapeutic targets for diseases associated with dysregulation of regulated cell death pathways. 展开更多
关键词 ESCRT PYROPTOSIS ferroptosis NECROPTOSIS plasma membrane repair
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Langmuir probe diagnostics in multi-Maxwellian EEDF plasmas
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作者 YIP Chi-shung JIN Chenyao +1 位作者 JIANG Di ZHANG Wei 《推进技术》 北大核心 2025年第6期254-274,共21页
This article provides a short review on the importance of the detailed analysis of a Langmuir probe I-V trace in a multi-Maxwellian plasma,and discuss proper procedures analyzing Langmuir probe I-V traces in bi-Maxwel... This article provides a short review on the importance of the detailed analysis of a Langmuir probe I-V trace in a multi-Maxwellian plasma,and discuss proper procedures analyzing Langmuir probe I-V traces in bi-Maxwellian and triple-Maxwellian Electron Energy Distribution Function(EEDF)plasmas.Discus⁃sion and demonstration of procedures include the treatment of the ion saturation current,electron saturation cur⁃rent,space-charge effects on the I-V trace,and most importantly how to properly isolate and fit for each electron group present in an I-V trace reflecting a mult-Maxwellian EEDF,as well as how having a multi-Maxwellian EEDF affects the procedures of treating the ion and electron saturation currents.Shortcomings of common improp⁃er procedures are discussed and demonstrated with simulated I-V traces to show how these procedures gives false measurements. 展开更多
关键词 plasma diagnostics Langmuir probes EEDFs I-V characteristics Electron temperature
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Research on 2D Model of Capillary Discharge Plasma
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作者 张玉成 蒋树君 +2 位作者 李兴文 李瑞 严文荣 《Defence Technology(防务技术)》 SCIE EI CAS 2010年第4期241-246,共6页
The physical process of capillary discharge in a PE tube utilized in electro-thermal-chemical(ETC)guns was investigated.ETC guns can enhance the ignition and combustion of propellant in order to reduce the ignition de... The physical process of capillary discharge in a PE tube utilized in electro-thermal-chemical(ETC)guns was investigated.ETC guns can enhance the ignition and combustion of propellant in order to reduce the ignition delay and increase muzzle velocity of the projectile.A key component in ETC gun is the capillary plasma source.In this paper,a 2D steady state model of discharge was built by using magnetic hydrodynamics method.It took the plasma energy balance,material ablation,mass and momentum conservations in a quasi-neutral plasma region into account.Also,the effect of different compositions and PE concentration distribution were considered.In order to evaluate the validation of this model,the simulation results are compared with former works. 展开更多
关键词 plasma physics capillary discharge plasma plasma ignition physical process MHD method steady state model electro-thermal-chemical gun
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Plasma-MIG复合电弧焊接特性分析 被引量:3
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作者 杨涛 许可望 +2 位作者 刘永贞 高洪明 吴林 《焊接学报》 EI CAS CSCD 北大核心 2013年第5期62-66,116,共5页
采用Plasma-MIG复合电弧对Q235低碳钢进行堆焊试验,对焊接过程中复合电弧形态、电弧空间分布、焊缝成形及细晶原理进行了分析.结果表明,Plasma-MIG复合电弧焊接过程中,外层等离子电弧单独存在,内层MIG电弧在焊丝端部与外层等离子弧耦合... 采用Plasma-MIG复合电弧对Q235低碳钢进行堆焊试验,对焊接过程中复合电弧形态、电弧空间分布、焊缝成形及细晶原理进行了分析.结果表明,Plasma-MIG复合电弧焊接过程中,外层等离子电弧单独存在,内层MIG电弧在焊丝端部与外层等离子弧耦合.复合电弧空间温度分布均匀,高温停留时间短,冷却速度快.Plasma-MIG复合电弧在大的等离子电流下,促进填充金属润湿铺展,焊缝熔宽大,成形美观.相同热输入量条件下,等离子电流增大能够促进晶粒自发形核,原奥氏体晶粒及焊缝组织得到细化. 展开更多
关键词 plasma—MIG复合电弧 电弧形态 空间温度分布 细化晶粒
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DC-Plasma-Jet表面冶金技术研究 被引量:18
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作者 李惠琪 李惠东 +3 位作者 李敏 孙玉宗 裴中爱 陈蕴博 《材料导报》 EI CAS CSCD 2004年第F10期194-197,共4页
分析了DC—Plasma—Jet直流放电压缩电孤等离子束表面冶金的技术内涵,研制了DC—Plasma—Jet表面冶金设备,对DC—Plasma—Jet表面冶金和目前的等离子堆焊技术进行了比较。DC—Plasma—Jet表面冶金是一种快速非平衡冶金反应过程,类似... 分析了DC—Plasma—Jet直流放电压缩电孤等离子束表面冶金的技术内涵,研制了DC—Plasma—Jet表面冶金设备,对DC—Plasma—Jet表面冶金和目前的等离子堆焊技术进行了比较。DC—Plasma—Jet表面冶金是一种快速非平衡冶金反应过程,类似粉末冶金,原则上可不受组成物的相溶性、熔点、密度等性质的限制,因此不需要预制合金雾化粉,可利用任意粉末的任意配比,获得通常冶金方法不能得到的组织与物相。DC—Plasma—Jet表面冶金方法效率高、操作简便、成本低、应用前景广阔。 展开更多
关键词 冶金技术 plasma 表面冶金 JET 技术内涵 等离子束 直流放电 冶金设备 堆焊技术 反应过程 粉末冶金 前景广阔 DC 相溶性 组成物 成本低 雾化
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增量型PID恒流恒压控制的Plasma-MIG复合电弧焊接 被引量:3
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作者 杨涛 张生虎 +3 位作者 高洪明 吴林 许可望 刘永贞 《焊接学报》 EI CAS CSCD 北大核心 2013年第3期81-84,88,共5页
Plasma-MIG复合电弧焊接对电源的外特性输出及焊接过程控制有着很高的要求,以VC++软件开发工具为平台,推导了适合于Plasma-MIG复合电弧焊接的增量型PID控制算法,实现了对复合电弧焊接过程控制及电源外特性的要求.结果表明,增量型PID恒... Plasma-MIG复合电弧焊接对电源的外特性输出及焊接过程控制有着很高的要求,以VC++软件开发工具为平台,推导了适合于Plasma-MIG复合电弧焊接的增量型PID控制算法,实现了对复合电弧焊接过程控制及电源外特性的要求.结果表明,增量型PID恒流恒压控制能够满足Plasma-MIG对电源外特性的输出要求.Plasma电弧和MIG电弧并不是相互独立的,两者以共享的电磁空间、导电气氛和焊丝为媒介建立起耦合关系.Plasma-MIG复合电弧焊接过程中,增量型PID控制下的Plasma电弧能够自发的调节自身电参数,来稳定电弧空间的电流密度,使得焊接过程中无飞溅.采用控制后,Plasma-MIG复合电弧焊焊接过程焊缝铺展好,焊接过程稳定,焊缝成形好. 展开更多
关键词 plasma—MIG复合电弧 增量型PID 焊接过程控制 外特性
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N_2O Plasma表面处理对SiN_x基IGZO-TFT性能的影响 被引量:2
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作者 李俊 周帆 +4 位作者 林华平 张浩 张建华 蒋雪茵 张志林 《发光学报》 EI CAS CSCD 北大核心 2012年第4期400-403,共4页
采用N2O plasma处理SiNx薄膜作为绝缘层,以室温下沉积的铟镓锌氧化物(IGZO)作为有源层制备了IGZO薄膜晶体管。与常规的IGZO-TFT相比,N2O plasma处理过的IGZO-TFT的迁移率由原来的4.5 cm2.V-1.s-1增加至8.1 cm2.V-1.s-1,阈值电压由原来的... 采用N2O plasma处理SiNx薄膜作为绝缘层,以室温下沉积的铟镓锌氧化物(IGZO)作为有源层制备了IGZO薄膜晶体管。与常规的IGZO-TFT相比,N2O plasma处理过的IGZO-TFT的迁移率由原来的4.5 cm2.V-1.s-1增加至8.1 cm2.V-1.s-1,阈值电压由原来的11.5 V减小至3.2 V,亚阈值摆由原来的1.25 V/decade减小至0.9V/decade。采用C-V方法计算了两种器件的陷阱态,结果发现N2O plasma处理过的IGZO-TFT的陷阱态明显小于普通的IGZO-TFT的陷阱态,表明N2O plasma处理SiNx绝缘层是一种改善IGZO-TFT器件性能的有效方法。 展开更多
关键词 薄膜晶体管 INGAZNO plasma处理 N2O
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PLASMA-MIG焊接控制系统的研制 被引量:2
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作者 张义顺 马国红 +2 位作者 邵成吉 王蕊 周晔 《沈阳工业大学学报》 EI CAS 2002年第5期378-380,共3页
介绍了一种新的铝及铝合金的焊接方法 ,即PLASMA MIG焊 ,并分别对系统的硬件组成、软件系统进行了分析 ,提出了整体实施方案 .利用双电弧PLASMA弧和MIG弧燃烧 ,焊缝成形好 ,质量好 。
关键词 控制系统 研制 plasma-MIG焊接 自动控制 双电弧 铝合金 等离子弧焊
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Numerical simulation of temperature and velocity fields in plasma spray 被引量:2
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作者 范群波 王鲁 王富耻 《Journal of Central South University of Technology》 EI 2007年第4期496-499,共4页
Based on the turbulence jet model, with respect to Ar-He mixture plasma gas injecting to ambient atmosphere, the temperature filed and velocity field under typical working conditions were investigated. Given the condi... Based on the turbulence jet model, with respect to Ar-He mixture plasma gas injecting to ambient atmosphere, the temperature filed and velocity field under typical working conditions were investigated. Given the conditions of I=900 A, FAr= 1.98 m^3/h, FEe=0.85 m^3/h, it is found that both the temperature and the velocity undergo a plateau region near the nozzle exit (0-10 mm) at the very first stage, then decrease abruptly from initial 13 543 K and 778.2 m/s to 4 000 K and 260.0 m/s, and finally decrease slowly again. Meanwhile, the radial temperature and radial velocity change relatively slow. The inner mechanism for such phenomena is due to the complex violent interaction between the high-temperature and high-velocity turbulent plasma jet and the ambient atmosphere. Compared with traditional methods, the initial working conditions can be directly related to the temperature and velocity fields of the plasma jet by deriving basic boundary conditions. 展开更多
关键词 plasma spray plasma jet temperature field velocity field
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Argon-Plasma对人工角膜支架材料组织相容性的影响
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作者 吴欣怡 盛新华 +2 位作者 陈璇 李淑卿 蔡可丽 《眼科新进展》 CAS 2001年第5期313-316,共4页
目的 探讨 3种人工角膜支架材料经 Argon- Plasm a处理后植入兔角膜对兔角膜组织的影响。方法 选用 3种支架材料 :材料 1:聚丙烯和聚丁烯 (80∶ 2 0 )化合而成的多孔材料 ;材料 2∶ Polyester多孔材料 ;材料 3:Expended polytetrafluo... 目的 探讨 3种人工角膜支架材料经 Argon- Plasm a处理后植入兔角膜对兔角膜组织的影响。方法 选用 3种支架材料 :材料 1:聚丙烯和聚丁烯 (80∶ 2 0 )化合而成的多孔材料 ;材料 2∶ Polyester多孔材料 ;材料 3:Expended polytetrafluoroethglene。上述 3种材料切成直径 6 mm的圆盘状 ,每种材料分为处理组和非处理组。处理组材料经 Argon-Plasma处理。选用 6 3只新西兰大白兔 ,共分为 7组 ,每组 9只 ,6组为实验组及对照组 (3组为处理组 ,3组为非处理组 ) ,1组为手术对照组。以显微手术的方法 ,将盘状支架材料植入囊袋内 ,手术对照组仅制备囊袋不植入材料。术后定期观察角膜水肿及新生血管的生长情况。术后 2 8、42、84d取角膜进行角膜组织学及免疫组织化学分析。结果 当材料经处理后角膜水肿较未处理明显减轻 ,8周后 3种材料中角膜水肿均消失。材料 1、2植入时新生血管出现延迟 ,范围也较小 ,同时炎细胞浸润明显减少。术后 6周纤维细胞迁徙入材料内 ,术后 12周空腔填充大量纤维细胞。材料处理与否不影响胶原蛋白的沉积。结论  Argon-Plasma处理可明显减轻兔角膜炎症反应 。 展开更多
关键词 人工角膜 组织相容性 Argon-plasma 动物实验
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磁控Plasma-FCAW水下复合焊工艺焊缝成形分析
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作者 王波 杨帆 +2 位作者 李连波 张洪涛 邓清文 《焊接学报》 EI CAS CSCD 北大核心 2022年第4期74-80,I0007,I0008,共9页
磁控等离子-药芯焊丝电弧复合焊(plasma-flux cored arc welding,Plasma-FCAW)作为一种新型水下高效焊接方法被提出,通过特殊焊炬结构设计实现了两种独立焊接工艺的优势互补.针对复合焊接工艺中由于电源极性不同引起的电弧排斥问题,设... 磁控等离子-药芯焊丝电弧复合焊(plasma-flux cored arc welding,Plasma-FCAW)作为一种新型水下高效焊接方法被提出,通过特殊焊炬结构设计实现了两种独立焊接工艺的优势互补.针对复合焊接工艺中由于电源极性不同引起的电弧排斥问题,设计了外部磁场用于调控两个电弧间的耦合程度,并研究了主要工艺参数对Q355B钢水下焊缝成形及其截面几何特征的影响.结果表明,施加的外部磁场能够有效改善复合焊接过程及焊缝成形的稳定性;药芯焊丝电弧焊(flux cored arc welding,FCAW)电压对水下复合焊接过程稳定性具有显著影响;等离子电流和FCAW电弧电压对焊缝熔深影响较大且等离子电流与熔深间呈近似线性关系;相比于水下FCAW工艺,复合焊工艺焊接熔深提升超过40%,具有更高的焊接效率和焊接稳定性. 展开更多
关键词 plasma-FCAW 水下复合焊 旁轴复合 磁场调控 焊缝成形
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Experimental Study on Plasma Temperature of Semiconductor Bridge
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作者 吴蓉 朱顺官 +2 位作者 张琳 李燕 冯红艳 《Defence Technology(防务技术)》 SCIE EI CAS 2012年第1期35-40,共6页
The plasma temperature of the semiconductor bridge (SCB) was measured in real-time according to relative intensity ratio of dual lines of atomic emission spectrum.The plasma temperature under different discharge pulse... The plasma temperature of the semiconductor bridge (SCB) was measured in real-time according to relative intensity ratio of dual lines of atomic emission spectrum.The plasma temperature under different discharge pulses and the influence of discharge pulse energy on it were studied.The results show that the plasma peak temperature rises gradually with the increase of initial discharging voltage and charging capacitance.For the capacitance of 22 μF,if the initial discharging voltage increases from 21 V to 63 V,the plasma peak temperature rises from 2 000 K to 6 200 K.For the discharging voltage of 39 V,the peak temperature rises from 2 200 K to 3 800 K when the capacitance increases from 6.8 μF to 100 μF.The change of pulse discharge has a very small effect on the plasma temperature at the late time discharge (LTD).In view of the change of plasma temperature with the pulse energy,the discharging voltage has a greater effect on the plasma temperature than the capacitance.The results provide some experimental basis for the further research on SCB ignition and detonation mechanisms. 展开更多
关键词 plasma physics semiconductor bridge plasma temperature atomic emission spectrometry discharge pulse
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Study on Ceramic Cutting by Plasma Arc
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作者 XU Wen-ji 1, FANG Jian-cheng 2, LU Yi-shen 1 (1. School of Mechanical Engineering, Dalian University of Technology, Dalian 116023, China 2. College of Mechanical Engineering and Automation, Huaqiao University, Quanzhou 362011, China) 《厦门大学学报(自然科学版)》 CAS CSCD 北大核心 2002年第S1期55-56,共2页
Engineering ceramics are typical difficult-to-machine materials because of high hardness and brittleness. PAC (Plasma Arc Cutting) is a very important thermal cutting process and has been successfully used in cutting ... Engineering ceramics are typical difficult-to-machine materials because of high hardness and brittleness. PAC (Plasma Arc Cutting) is a very important thermal cutting process and has been successfully used in cutting stainless steel and other difficult-to-machine alloys. PAC’s application in cutting ceramics, however, is still limited because the most ceramics are not good electronic conducts, and transferred plasma arc cannot be produced between cathode and work-piece. So we presented a method of plasma arc cutting engineering ceramics with additional anode. To reduce the kerf width and to improve the kerf quality, the hydro-magnetically confined plasma arc is used to cut engineering ceramic plates. By experiments and analyses the mechanism and characteristics of hydro-magnetic confined plasma are discussed and the effects of secondary confinement on cutting quality, arc properties, and optimal process parameters are presented. When the nozzle diameter is 3 mm, the kerf width of the Al 2O 3 ceramic plate with 6 mm thickness is less than 4.6 mm, and the cutting speed reaches to 0.9~1.2 m/min. Both theoretical analysis and experimental results have proved the feasibility and validity of the newly advanced hydro-magnetic plasma arc cutting, and the following conclusion can be drawn: (1)Synthesizing the advantages of both the water-constriction and magnetic constriction, the hydro-magnetic constriction of plasma arc forms a three-dimensional constriction with improved shape and uniformity of arc column, narrower kerfs, minimal beveling of cuts and higher dross-free cutting speeds than those under either water-constriction or magnetic constriction alone.(2)Hydro-magnetic constriction is capable of improving arc stability, which is reflected in the higher arc voltage at which arc-extinction occurs, than that under any single constriction. (3)For a given diameter of nozzle, quality cut can be produced by using a lower arc current than usually required in conventional plasma arc cutting, but ensuring fine arc shape and capability of cutting simply by employing hydro-magnetic constriction. Meanwhile, the heat load on nozzle could be reduced and service life of nozzle raised. 展开更多
关键词 plasma cutting engineering ceramic plasma confinement
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PLASMA自适应调优与性能优化的设计与实现
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作者 吕渐春 张云泉 +1 位作者 王婷 肖玄基 《计算机科学》 CSCD 北大核心 2012年第4期282-286,共5页
PLASMA是一个高效的线性代数软件包,其数据分布结合分堆、细粒度并行以及乱序执行机制等大大提高了程序的性能。但PLASMA仍然存在一些问题,比如分块大小对程序性能的影响非常大,以及产生了大量的数据拷贝等。通过对比传统的LAPACK和PLA... PLASMA是一个高效的线性代数软件包,其数据分布结合分堆、细粒度并行以及乱序执行机制等大大提高了程序的性能。但PLASMA仍然存在一些问题,比如分块大小对程序性能的影响非常大,以及产生了大量的数据拷贝等。通过对比传统的LAPACK和PLASMA的实现机制,分析了PLASMA中存在的优势和不足,介绍了两种弥补PLASMA自身不足的方法。针对PLASMA的架构,经过大量的测试与分析,提出了边缘矩阵的概念并分析了其对性能的影响,据此提出了一种自适应调优的方法。并通过数据拷贝与计算并行的运行方式,进一步提高了PLASMA性能,最后通过大量的测试验证了该优化方法的效果。 展开更多
关键词 LAPACK plasma 自适应调优 优化
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Wentzel-Kramer-Brillouin and finite-difierence time-domain analysis of Terahertz band electromagnetic characteristics of target coated with unmagnetized plasma 被引量:7
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作者 Liu Shaobin Zhou Tao +1 位作者 Liu Meilin Hong Wei 《Journal of Systems Engineering and Electronics》 SCIE EI CSCD 2008年第1期15-20,共6页
We investigate computationally the attenuation and reflection of Terahertz (THz) wave using targets coated with plasmas. The simulators are the Wentzel-Kramer-Brillouin (WKB) method and finite-difference timedoma... We investigate computationally the attenuation and reflection of Terahertz (THz) wave using targets coated with plasmas. The simulators are the Wentzel-Kramer-Brillouin (WKB) method and finite-difference timedomain (FDTD) method. The relation between the frequency of the incident electromagnetic (EM) wave and the attenuation caused by unmagnitized plasma is analyzed. The results demonstrate that the amount of absorbed power is a decreasing function of the EM wave frequency and the plasma collision frequency. For THz band incident wave, the attenuation that is caused by plasma is small when the plasma has common density and the collision frequency. This conclusion has fine applying foreground for plasma anti stealth. 展开更多
关键词 frequency dispersion WKB method FDTD methods unmagnetized plasma Terahertz wave
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Plasma处理对有机薄膜电致发光器件性能及稳定性的影响 被引量:2
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作者 张志林 蒋雪茵 +3 位作者 赵伟明 许少鸿 李述汤 孙鑫 《发光学报》 EI CAS CSCD 北大核心 1998年第4期367-369,共3页
有机薄膜电致发光是双极注入的发光器件,电极及注入界面是影响器件性能的重要因素,采用高功函数透明电极及低功函数金属电极是普遍使用的方法,人们还采用高离化势的有机透明电极[1],低离化势的CuPcBufer层[2],pl... 有机薄膜电致发光是双极注入的发光器件,电极及注入界面是影响器件性能的重要因素,采用高功函数透明电极及低功函数金属电极是普遍使用的方法,人们还采用高离化势的有机透明电极[1],低离化势的CuPcBufer层[2],plasma处理ITO的方法[3]来改... 展开更多
关键词 有机薄膜 电致发光器件 等离子体处理 稳定性
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Measurement of Plasma Parameters of Calcium and Silicon in a Rock Sample Using Laser Induced Breakdown Spectroscopy 被引量:4
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作者 Uzma G M.Junaid +1 位作者 Khalid Alamgir T Samina 《光谱学与光谱分析》 SCIE EI CAS CSCD 北大核心 2017年第10期3266-3269,共4页
Laser Induced Breakdown Spectroscopic(LIBS)technique was used to detect calcium and silicon in an unknown sample.In this method plasma was generated by Nd∶YAG laser of wavelength 1 064 nm with energy 400 mJ and pulse... Laser Induced Breakdown Spectroscopic(LIBS)technique was used to detect calcium and silicon in an unknown sample.In this method plasma was generated by Nd∶YAG laser of wavelength 1 064 nm with energy 400 mJ and pulse duration between 5~10ns.The method was applied for the qualitative as well as quantitative analysis.In the qualitative analysis,the electron number density(Ne)of plasma containing calcium and silicon is determined showing that Neof neutral particles is equivalent to 1016(cm-3)whereas for ionized particles it is 1017(cm-3).Plasma temperature is measured using Boltzmann plot method which must be greater than 10 000 k.Intensity ratio method is used for the quantitative analysis shows various elements in abundance with calcium and silicon in majority. 展开更多
关键词 LIBS plasma parameter Quantitative analysis Qualitative analysis
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Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry 被引量:11
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作者 聂西度 梁逸曾 +1 位作者 唐有根 谢华林 《Journal of Central South University》 SCIE EI CAS 2012年第9期2416-2420,共5页
The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was diss... The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was dissolved in HNO3 and HCI by microwave digestion. Most of the spectral interferences could be avoided by measuring in the high resolution mode. The matrix effects because of the presence of excess HC1 and nickel were evaluated. Correction for matrix effects was made using Sc, Rh and T1 as internal standards. The optimum conditions for the determination were tested and discussed. The detection limits range from 0.012 to 1.76 ~tg/g depending on the type of elements. The applicability of the proposed method is also validated by the analysis of high purity nickel reference material (NIST SRM 671). The relative standard deviation (RSD) is less than 3.3%. Results for determination of trace elements in high purity nickel were presented. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity nickel trace element matrix effect internal standard
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Piecewise linear recursive convolution FDTD method for magnetized plasmas 被引量:4
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作者 Liu Song Zhong Shuangying Liu Shaobin 《Journal of Systems Engineering and Electronics》 SCIE EI CSCD 2006年第2期290-295,共6页
The piecewise linear recursive convolution (PLRC) finite-different time-domain (FDTD) method greatly improves accuracy over the original recursive convolution (RC) FDTD approach but retains its speed and efficie... The piecewise linear recursive convolution (PLRC) finite-different time-domain (FDTD) method greatly improves accuracy over the original recursive convolution (RC) FDTD approach but retains its speed and efficiency advantages. A PLRC-FDTD formulation for magnetized plasma which incorporates both anisotropy and frequency dispersion at the same time is presented, enabled the transient analysis of magnetized plasma media. The technique is illustrated by numerical simulations the reflection and transmission coefficients through a magnetized plasma layer. The results show that the PLRC-FDTD method has significantly improved the accuracy over the original RC method. 展开更多
关键词 electromagnetic wave FDTD methods piecewise linear recursive convolution magnetized plasma.
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Influence of spark plasma sintering on microstructure and corrosion behaviour of Ti-6Al-4V alloy reinforced with micron-sized Si_3N_4powder 被引量:2
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作者 F.M.Kgoete A.P.I.Popoola O.S.I.Fayomi 《Defence Technology(防务技术)》 SCIE EI CAS CSCD 2018年第5期403-407,共5页
Ti-6 Al-4 V-Si3 N4 composites were effectively fabricated by spark plasma sintering(SPS) technique. The addition of Si_3 N_4 on Ti-6 AI-4 V was varied from 5% to 15%(wt fraction). The effect of Si_3 N_4 addition on th... Ti-6 Al-4 V-Si3 N4 composites were effectively fabricated by spark plasma sintering(SPS) technique. The addition of Si_3 N_4 on Ti-6 AI-4 V was varied from 5% to 15%(wt fraction). The effect of Si_3 N_4 addition on the densification, microstructure, and microhardness and corrosion behaviour of Ti-6 Al-4 V was investigated.An increase in microhardness value was recorded from 325.46 HV_(0.1) to 585.73 HV_(0.1). X-ray diffraction(XRD) analysis showed that the intensity of diffraction peaks of Si3 N4 phase in the composites increased.The sintered Ti-6 Al-4 V reinforced with Si_3 N_4 compacts revealed the non-existence of intermediate phases, such as TiSi_2(titanium silicide) which was expected. SEM analysis of the spark plasma sintered composites revealed a and β phase microstructures in Ti-6 Al-4 V with uniform distribution of Si3 N4 particulates in the matrix. The corrosion resistance property of the material was improved by the addition of Si_3 N_4 from 0.986629 mm/year to 0.030547 mm/year. 展开更多
关键词 Spark plasma sintering SI3N4 TI-6AL-4V MICROSTRUCTURE Corrosion
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