摘要
本文在不同工艺条件下,利用扫描电镜,X射线衍射仪,M-200磨损试验机以及显微硬度计等,对多弧离子镀TiN涂层的表面形貌组织结构以及性能进行了分析研究,揭示了电磁场氮分压对TiN镀层的综合影响。
In this Paper, the TiN coating was plated by multi-arc source ion plating equipment.The surface mor-phology,Structure and performance of film in different technological conditions were investigated by SEM,XRD,M-2OO wearing machine,microhardometer.It was showed that TiN film was influnenced by magnet-ic field and N_2 partial pressure.
出处
《材料工程》
EI
CAS
CSCD
北大核心
1993年第12期35-37,共3页
Journal of Materials Engineering
基金
江西省自然科学基金
关键词
离子镀
电磁场
氮分压
Ion Plating
magnetic field
N_2 partial pressure
