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工作气压对TiO_2薄膜结构的影响 被引量：2

Investigation on structure of TiO_2 films sputtered NiMnCo substrates
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摘要 用射频磁控溅射方法以纯金属钛做靶材在氩氧混合气体中制备了TiO2薄膜,Raman光谱测量表明,工作气压从0.2Pa变化到2Pa时,TiO2薄膜的结构由金红石相变化到锐钛矿相,厚度对TiO2薄膜结构没有明显影响. Titainum dioxide (TiO2) films have been successfully deposited on NiMnCo (substrates) by radio-frequency (RF) magnetron reactive sputtering using pure Ti(99.99%) as the target and Ar mixed with N2 as reactivegas. The effects of gas total pressure on the structure and phase transition of TiO2 films were studied by Raman spectra. It is indicated that the film structure changes from rutile to anatase while work gas total pressure changes from (0.2)Pa to 2Pa. The structure of TiO2 films is not affected by the film thickness.
作者 李哲奎 顾广瑞 孙文斗 李全军 赵永年
机构地区 延边大学理工学院物理系 延边广播电视大学 吉林大学超硬材料国家重点实验室
出处 《延边大学学报（自然科学版）》 CAS 2004年第2期96-99,共4页 Journal of Yanbian University（Natural Science Edition）
关键词 TIO2薄膜 RAMAN光谱 金红石 锐钛矿 Titainum dioxide films Raman spectrum Rutile Anatase
分类号 O647.2 [理学—物理化学]
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参考文献13

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同被引文献19

  • 1郑伟涛.薄膜材料与薄膜技术[M].北京:化学工业出版社,2007.
  • 2Tachibana Y, Akiyama H Y, Kuwabata S. Optical simulation of transmittance into a nanocrystalline anatase TiO2 film for solar cell applications[J]. Vacuum, 2007,91:201-206.
  • 3Ljubas D. Solar photoeatalysis a possible step in dringking water treatment[J]. Energy, 2005, 30 (10) : 1699-1710.
  • 4Xin Yanjun. Study on preparation and photocatalyt ie degradation of alachlor on TiO2/Ti photoelectro des prepared by microarc oxidation method [J]. Procedia Engineering, 2012,27:538-545.
  • 5Meng Fanming, Song Xueping, Sun Zhaoqi. Photo- catalytic activity of TiO2 thin films deposited by RF magnetron sputtering[J]. Vacuum, 2009,83 : 1147- 1151.
  • 6Nam S H, Cho S J, Jung C K, et al. Comparison of hydrophilic properties of TiO2 thin films prepared by sol-gel method and reactive magnetron sputtering system [ J ]. Thin Solid Films, 2011, 519: 6944-6950.
  • 7Swati S P, Sambita S, Pradhan S K. Influence of annealing temperature on the structural, mechanical and wetting property of TiOz films deposited by Rf magnetron sputtering[J]. Thin Solid Films, 2010, 518:6904-6908.
  • 8Tomaszek R, Znamirowski Z, Pawlowski L, et al. Effect of conditioning on field electron emission of suspension plasma sprayed TiO2 coatings[J]. Vacu- um, 2007,81 : 1278-1282.
  • 9Kim D J, Kim K S. Prediction of TiO2 thin film growth on the glass heads in a rotating plasma chemical vapor deposition reactor[J]. Journal of Nanoscience and Nanotechnology, 2010, 10: 3211- 3215.
  • 10Karunagaran B, Mangalaraj D, Senthil K V, et al Structural characterization of DC magnetron-sput tered TiO2 thin films using XRD and Raman scat tering studies [J]. Materials Science in Semicon ductor Processing, 2003,6:547-550.

引证文献2

二级引证文献8

延边大学学报（自然科学版）
2004年 第2期

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