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铕掺杂BGO晶体的辐照损伤及余辉 被引量:6

Radiation Damage and Afterglow of Europium Doped Bi_4Ge_3O_(12)(BGO) Crystal
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摘要 采用透射光谱分析、荧光脉冲响应分析及荧光发射光谱等测试手段,研究了一系列不同量铕掺杂 BGO 晶体的辐照损伤及余辉。结果表明,5 ppm Eu_2O_3(wt)掺杂即可达到最佳的抗辐照损伤能力,而且因为 Eu^(3+)离子浓度低,由它引起的荧光衰减余辉也很小。还讨论了微量铕掺杂能提高 BGO 晶体抗辐照损伤能力和随同产生余辉的机制。 The radiation damage and afterglow of a series of Eu-doped BGO crystals werestudied by means of optical transmission spectra,fluorescence emission spectra andfluorescence pulse response analyses。Experimental results showed that a doping of5 ppm of Eu_2O_3(wt)in BGO crystal is enough to achieve the optimum conditionof radiation hardness and only a very small amplitude of afterglow appeared due toits low Eu^(3+) ion concentration.The mechanism of the improvement of the radiationhardness and the appearance of afterglow by doping small amount of Eu_2O_3 inBGO crystals were also discussed in the present paper.
出处 《无机材料学报》 SCIE EI CAS CSCD 北大核心 1992年第1期1-6,共6页 Journal of Inorganic Materials
关键词 辐照损伤 BGO 晶体 余辉 Radiation damage Afterglow Scintillation decay
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参考文献3

  • 1殷之文,Nucl Instr Methods in Phys Res,1989年,225卷,273页
  • 2魏宗英,1988年
  • 3He C F,Prog Crystal Growth and Charact,1985年,11卷,253页

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