摘要
化学放大胶(ChemicallyAmplifiedResists,简称CARs)是下一代光刻技术中极具发展潜力的一种光学记录介质。介绍了化学放大胶在电子束光刻技术中图形制作工艺的关键步骤以及目前常用的几种化学放大胶,分析了将化学放大胶用于电子束曝光工艺应注意的问题和它将来的发展趋势。
Chemically amplified resists(CARs )are the most promising optical recording materials for the next generation lithography.The key steps of the pattern-making process with CARs via electron beam lithography,together with the popular types,are introduced.The problems encoun-tered in the process of CARs and their development tendency are analyzed.
出处
《微纳电子技术》
CAS
2003年第12期43-46,共4页
Micronanoelectronic Technology
