摘要
随着半导体制造工艺的发展,气态分子污染物(AMCs)对芯片良率和可靠性的影响日益显著。气态分子污染物包括酸性污染物(MA)、碱性污染物(MB)、可凝结物(MC)、拆杂物(MD)、金属污染物(MM),其中酸性污染物和金属污染物是AMCs中极为重要的两类污染物。依据酸性污染物和金属污染物的主要来源及影响机制,伴随着多种采样及前处理技术技术的开发,包括冲击瓶吸收法、吸附管采样、液相萃取法、气相分解法、容器采样和在线采样等,采样后通过先进的分析技术检测含量:酸性污染物主要以离子色谱法(IC)为主,辅以化学发光法、紫外荧光法、离子迁移谱法及光腔衰荡光谱法(CRDS)等,金属污染物以电感耦合等离子体发射光谱与质谱(ICP-OES/ICP-MS)为主,同时有一些探索性的方法如全反射X射线荧光光谱法(TXRF)。根据目前面临的挑战,未来研究需聚焦高灵敏度实时监测、新型前处理方法开发及智能化污染溯源,以应对先进制程的带来的洁净度挑战,为半导体制造的可持续发展提供技术支撑。
With the advancement of semiconductor manufacturing processes,airborne molecular contaminants(AMCs)have emerged as critical factors affecting chip yield and reliability.AMCs include acidic contaminants(MA),alkaline contaminants(MB),condensable compounds(MC),dopants(MD),and metallic contaminants(MM),among which acidic and metallic contaminants are particularly significant.Based on their primary sources and impact mechanisms of acidic and metallic contaminants,various sampling and pretreatment techniques have been developed,including impinger absorption,adsorbent tube sampling,liquid-phase extraction,vapor phase decomposition(VPD),container sampling,and online sampling.After sampling,advanced analytical techniques are employed for detection:acidic species are primarily analyzed using ion chromatography(IC),supplemented by methods such as chemiluminescence,ultraviolet fluorescence,ion mobility spectrometry(IMS),and cavity ring-down spectroscopy(CRDS).Metallic contaminants are mainly detected via inductively coupled plasma optical emission spectrometry and mass spectrometry(ICP-OES/ICP-MS),along with exploratory methods such as total reflection X-ray fluorescence spectroscopy(TXRF).To address current challenges in AMC detection,future research should focus on the development of high-sensitivity real-time monitoring,novel pretreatment strategies,and intelligent contamination source tracing system.These efforts aim to meet the increasingly stringent cleanliness requirements of advanced semiconductor process nodes and to support for the sustainable development of semiconductor manufacturing.
作者
蔡灵喜
许竞早
彭振磊
张育红
CAI Ling-xi;XU Jing-zao;PENG Zhen-lei;ZHANG Yu-hong(Sinopec(Shanghai)Research Institute of Petrochemical Technology Co.,Ltd.,Shanghai 201208,China)
出处
《化学试剂》
2025年第9期1-8,共8页
Chemical Reagents
作者简介
蔡灵喜(1998-),男,江苏无锡人,学士,主要研究方向为精细化学品分析;通讯作者:许竞早,E-mail:xjz.sshy@sinopec.com。
