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g-C_(3)N_(4)的改性及其在光催化领域的研究进展 被引量:1

Research progress on modification of g-C_(3)N_(4)and its application in the field of photocatalysis
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摘要 半导体光催化技术作为人工光合作用,可缓解当前全球面临的环境污染和能源短缺危机,近年来已成为热门研究方向。石墨相氮化碳(g-C_(3)N_(4))是一种二维层状结构半导体材料,制备方法简单,具有良好的可见光响应能力,是当前光催化材料的研究热点。直接聚合含氮前驱体制备的g-C_(3)N_(4)光催化性能较差,需对g-C_(3)N_(4)进行性能调控。该文简单介绍了g-C_(3)N_(4)的主要制备方法;阐述了g-C_(3)N_(4)的改性方法,包括提升结晶度、构建异质结、调控形貌、缺陷工程,并总结了g-C_(3)N_(4)在光催化领域的应用,包括降解有机污染物、分解水制氢、生产H_(2)O_(2)、还原CO_(2);最后,对g-C_(3)N_(4)的未来发展进行了展望,在持续提升g-C_(3)N_(4)光催化性能的同时,应更多考虑实际工业化生产面临的相关设计问题,并将熔融盐法制备高结晶g-C_(3)N_(4)深入探究、g-C_(3)N_(4)基异质结体系的搭建、g-C_(3)N_(4)中光生载流子的分离机制明确、反应物在g-C_(3)N_(4)表面的吸脱附和氧化还原反应的作用机制分析、可回收g-C_(3)N_(4)基光催化剂研究5个方面作为重点发展方向。 Semiconductor photocatalysis technology,an artificial photosynthesis which can alleviate the current global environmental pollution and energy shortage crisis,has become a hot research direction in recent years.Graphitic carbon nitride(g-C_(3)N_(4)),a two-dimensional layered semiconductor material with simple preparation and good visible light response capability,is currently the research focus of photocatalytic materials.However,the poor photocatalytic performance of g-C_(3)N_(4)prepared from direct polymerization of nitrogen-containing precursor system makes the performance regulation necessary.Herein,the main preparation methods of g-C_(3)N_(4)were briefly introduced.The modification methods of g-C_(3)N_(4),including crystallinity improvement,heterojunction construction,morphology regulation and defect engineering were then elaborated.The application of g-C_(3)N_(4)in the field of photocatalysis,such as degradation of organic pollutants,decomposition of water to produce hydrogen,production of H_(2)O_(2) and reduction of CO_(2) were further summarized.Finally,the future development of g-C_(3)N_(4)was prospected,while continuously improving the photocatalytic performance of g-C_(3)N_(4),more consideration should be given to the design problems faced by actual industrial production.Further research on the preparation of highly crystalline g-C_(3)N_(4)by molten salt method,construction of g-C_(3)N_(4)-based heterostructure system,clear separation mechanism of photogenic carrier in g-C_(3)N_(4),mechanism analysis of adsorption and redox reaction of reactants on g-C_(3)N_(4)surface,and research of recoverable g-C_(3)N_(4)-based photocatalysts were regarded as the key development directions.
作者 匡代洪 张佳睿 杨佳东 阿瓦拜克力·肉苏里 谢瑜 KUANG Daihong;ZHANG Jiarui;YANG Jiadong;AWABAIKELI Rousuli;XIE Yu(College of Resources and Environment,Xinjiang Agricultural University,Urumqi 830052,Xinjiang,China;College of Mathematics and Physics,Xinjiang Agricultural University,Urumqi 830052,Xinjiang,China)
出处 《精细化工》 北大核心 2025年第7期1418-1433,共16页 Fine Chemicals
基金 新疆维吾尔自治区自然科学基金项目(2022D01A201)。
关键词 光催化技术 g-C_(3)N_(4) 半导体材料 性能调控 改性方法 photocatalytic technologies g-C_(3)N_(4) semiconductor materials performance modulation modification methods
作者简介 匡代洪(1977-),男,副教授,E-mail:kuangdh0828@163.com。
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