摘要
Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components.By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures,metasurfaces enable the efficient manipulation of the amplitude,phase,polarization,and frequency of light and derive a series of possibilities for important applications.However,one key challenge for the realization of applications for meta-devices is how to fabricate large-scale,uniform nanostructures with high resolution.In this review,we review the state-of-the-art nanofabrication techniques compatible with the manufacture of meta-devices.Maskless lithography,masked lithography,and other nanofabrication techniques are highlighted in detail.We also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications.
基金
support from the University Grants Committee/Research Grants Council of the Hong Kong Special Administrative Region,China[Project No.AoE/P-502/20,CRF Project:C1015-21E
C5031-22G,and GRF Project:CityU15303521,CityU11305223,CityU11310522,CityU11300123]
the Department of Science and Technology of Guangdong Province[Project No.2020B1515120073]
City University of Hong Kong[Project No.9380131,9610628,and 7005867]
S.M.Xiao acknowledges financial support from National Key R&D Program of China(Grant Nos.2021YFA1400802)
the National Natural Science Foundation of China(Grant Nos.62125501,and 6233000076)
Fundamental Research Funds for the Central Universities(Grant No.2022FRRK030004
Shenzhen Fundamental Research Projects(Grant Nos.JCYJ20220818102218040).
作者简介
Correspondence:Din Ping Tsai,dptsai@cityu.edu.hk;Correspondence:Shumin Xiao,shumin.xiao@hit.edu.cn。
