摘要
采用高分辨电感耦合等离子质谱仪检测二氧化硅抛光液中金属杂质元素,通过调节元素分辨力,选择适合的同位素进行检测,可有效解决质谱干扰问题。采用标准加入法稀释样品检测金属杂质含量的方法,10μg/kg加标回收率为81.17%~111.79%,可以实现对二氧化硅抛光液中多金属杂质的快速分析。
In this paper,the high resolution inductively coupled plasma mass spectrometeris used to detect metal impurities in silicon oxide polishing liquid.By adjusting element resolution and selecting suitable isotope for detection,the problem of mass spectrum interference can be effectively solved.The standard addition method was used to dilute the samples for the detection of metal impurities,and the recovery rate of 10μg/kg was between 81.17%and 111.79%,which can realize the rapid analysis of metal impurities in silica slurry.
作者
郝萍
Hao Ping(Shanghai Institute of Measurement and Testing Technology)
出处
《上海计量测试》
2024年第4期11-13,17,共4页
Shanghai Measurement and Testing
基金
国家市场监督管理总局科技计划项目(2021MK033)。
