摘要
采用粉末冶金方法制备了添加不同质量分数(0~7%)钽的Ni-5Al和Ni-10Al镍基高温合金,通过1100℃×100 h的高温氧化试验研究了钽的添加对这2种合金高温抗氧化机理的影响。结果表明:添加相同含量钽的Ni-10Al合金单位面积氧化质量增量高于Ni-5Al合金;钽的添加促进了Ni-5Al合金氧化膜中NiO的长大和NiTa_(2)O_(6)的生成,随着氧化过程进行,Al_(2)O_(3)和NiAl_(2)O_(4)组成的氧化层在NiO/基体界面处生成,阻碍了合金的进一步氧化;添加钽的Ni-10Al合金表面氧化膜包括外侧致密NiO氧化层以及内侧疏松的由NiO、Al_(2)O_(3)、NiAl_(2)O_(4)和NiTa_(2)O_(6)组成的氧化层,内氧化层中存在细小孔洞,该合金较差的高温抗氧化性与疏松的氧化膜以及氧化膜内缺陷和NiTa_(2)O_(6)的形成有关。
Ni-based high-temperature alloys with different mass fractions(0-7%)of tantalum were prepared by powder metallurgy based on the composition of Ni-5Al and Ni-10Al alloy,and the effect of tantalum addition on the high temperature oxidation mechanisms of two alloys was investigated by 1100℃×100 h high temperature oxidation test.The results show that oxidation mass gain per unit area of Ni-10Al alloy with the same content tantalum was higher than that of Ni-5Al alloy.The addition of tantalum promoted the growth of NiO and the formation of NiTa_(2)O_(6)in the oxide film of Ni-5Al alloy;as the oxidation went on,the oxide layer composed of Al_(2)O_(3)and NiAl_(2)O_(4)formed at the NiO/matrix interface,which hindered the further oxidation of the alloy.The oxide film on surface of Ni-10Al alloy with tantalum consisted of a dense NiO oxide layer on the outside and a loose oxide layer on the inside composed of NiO,Al_(2)O_(3),NiAl_(2)O_(4)and NiTa_(2)O_(6);there were fine holes in the inner oxide layer;the low high temperature oxidation resistance of the alloy was related to the loose oxide film,and formation of defects and NiTa_(2)O_(6)in the oxide film.
作者
王慧聪
刘景叶
李伟洲
解传滨
李浩
张修海
WANG Huicong;LIU Jingye;LI Weizhou;XIE Chuanbin;LI Hao;ZHANG Xiuhai(Key Laboratory of Nonferrous Materials and New Processing Technology of Ministry of Education,Guangxi University,Nanning 530004,China)
出处
《机械工程材料》
CAS
CSCD
北大核心
2022年第8期58-67,共10页
Materials For Mechanical Engineering
基金
广西科技重大专项项目(AA18118030,AA17204100)
广西自然科学基金资助项目(2016GXNSFDA380022)
广西高等学校高水平创新团队项目(第二批)(GXYSOF1813)
广西有色金属及特色材料加工重点实验室开发基金资助项目(GXYSSF1804)。
关键词
镍基高温合金
钽
高温抗氧化性能
氧化膜
nickel-based high-temperature alloy
tantalum
high temperature oxidation resistance
oxide film
作者简介
王慧聪(1997-),男,山东菏泽人,硕士研究生;通信作者:张修海,副教授。
