摘要
采用直流磁控反应溅射法,以不同掠射角度在ITO/PET衬底上沉积WO_(3)薄膜。利用场发射扫描电子显微镜(FE-SEM)和能谱仪(EDS)对WO_(3)薄膜表面和断面的形貌及化学组成进行表征;利用电化学工作站和紫外分光光度计对WO_(3)薄膜的电化学性能和光学性能进行分析。结果表明,当掠射角α>60°时,薄膜表面形成类似于山峰状形貌,断面为纳米斜柱状结构,该结构有利于离子和电子的迁移。当掠射角α=80°时,沉积的WO_(3)薄膜具有最快离子扩散速率和最大光调制幅度,着色效率达到27.05 cm^(2)/C。同时,薄膜还表现出快速响应和良好循环稳定性。
WO_(3)thin films were deposited on ITO/PET substrates by DC magnetron reactive sputtering at different glancing angles.The surface and cross-section morphologies as well as chemical composition of WO_(3)thin film were characterized by field emission scanning electron microscope(FE-SEM)and energy dispersive spectrometer(EDS).Electrochemical and optical performances were measured by electrochemical workstation and UV-vis spectrophotometer.The results show that the film surface forms a mountain-like morphology as the glancing angleα>60°,and the cross-section presents slant nano-columnar structure,which is beneficial to the migration of ions and electrons.As the glancing angleα=80°,WO_(3)thin film has the fastest ion diffusion rate and the largest light modulation amplitude.The colorization efficiency reaches to 27.05 cm^(2)/C.Furthermore,the film also shows fast response and good cycle stability.
作者
王冠杰
王美涵
文哲
魏丽颖
雷浩
孙立贤
徐芬
Wang Guanjie;Wang Meihan;Wen Zhe;Wei Liying;Lei Hao;Sun Lixian;Xu Fen(Shenyang University,Shenyang 110044,China;Aluminum Valley Industrial Technology Institute,Zouping 256200,China;Guilin University of Electronic Technology,Guilin 541004,China)
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2022年第4期1448-1454,共7页
Rare Metal Materials and Engineering
基金
辽宁省高等学校创新人才支持计划(LR2019044)
辽宁省自然科学基金指导计划项目(2019-ZD-0540)
沈阳市中青年科技创新人才支持计划(RC190359)
广西信息材料重点实验室开放课题(191007-K)。
作者简介
王冠杰,男,1996年生,硕士生,沈阳大学机械工程学院,辽宁沈阳110044,E-mail:1746586994@qq.com;Corresponding author:Wang Meihan,Ph.D.,Professor,Shenyang University,Shenyang 110044,P.R.China,E-mail:mhwang@syu.edu.cn。
