摘要
为改善掺杂Ti的GLC/Ti薄膜的摩擦学性能,采用非平衡磁控溅射技术在不同C靶电流下制备了类石墨碳基薄膜。利用扫描电子显微镜(SEM)、拉曼光谱仪(Raman)对薄膜结构进行表征;采用纳米压痕仪测量薄膜的硬度及弹性模量;利用HSR-2M型高速往复试验机测试薄膜在干摩擦条件下的摩擦磨损性能,并用白光干涉仪观察磨痕表面形貌。结果表明:随着C靶电流的增大,薄膜的柱状生长趋势日趋明显,其致密性降低,sp2键含量减小,石墨化程度和结合力降低,而硬度和弹性模量略增;随着C靶电流的增大,摩擦因数和磨损率均增大。因此,适当降低C靶电流可以提高磁控溅射GLC/Ti薄膜干摩擦条件下的减摩耐磨性能。
In order to improve dry tribological properties of Ti-doped GLC/Ti films,the graphite-like carbon film were fabricated by magnetron sputtering under different carbon target currents.Scanning electron microscope(SEM),Raman spectrometer(Raman)were used to characterize the membrane structure.The hardness and elastic modulus of the thin film were measured by nano indentation instrument.The friction and wear performance of thin film under dry friction condition was tested by HSR-2M high speed reciprocating testing machine.The wear marks were observed by white light interference.Results show that with the increase of C target current,the columnar growth trend of the thin film becomes more and more obvious,the density of the thin film,the sp2 bond content,the graphitization degree and the binding force are all decreased,and the hardness and the elastic modulus are slightly increased.Therefore,appropriate reduction of C target current can improve the friction reducing and wear resistance of GLC/Ti thin films under dry friction conditions.
作者
谷守旭
李迎春
邱明
庞晓旭
范恒华
GU Shouxu;LI Yingchun;QIU Ming;PANG Xiaoxu;FAN Henghua(School of Mechatronics Engineering,Henan University of Science and Technology,Luoyang Henan 471003,China;Collaborative Innovation Center of Machinery Equipment Advanced Manufacturing of Henan Province,Henan University of Science and Technology,Luoyang Henan 471003,China)
出处
《润滑与密封》
CAS
CSCD
北大核心
2021年第9期32-39,共8页
Lubrication Engineering
基金
国家重点研发计划项目(2018YFB2000203)
河南省高端外国专家引进计划(HNGD2020003).
关键词
GLC薄膜
微观结构
摩擦学性能
靶电流
GLC film
microstructure
tribological performance
target current
作者简介
谷守旭(1994—),男,硕士,研究方向为表面工程,E-mail:1607409132@qq.com;通信作者:李迎春(1969—),女,硕士,副教授,研究方向为摩擦学与表面工程,E-mail:lyc2004henan.china@126.com.
