摘要
在SiO2基体上电化学沉积400nm厚度银涂层,然后用扫描电镜能谱仪进行成分表征时,结果出现异常现象。利用原子力显微镜(AFM)和蒙特卡洛模拟(Monte Carlo Simulation)软件对该异常现象产生原因进行了分析。结果表明:氧元素的特征X射线能量Kα=0。525keV,该能量能级较低难以穿透400nm厚度的银涂层,硅元素的特征X射线能量Kα=1。74keV,Kβ=1。838keV,能级较高,能够穿透该厚度的银涂层。
The Ag coating with thickness of 400 nm was electrochemical deposited on the SiO2 matrix,and then the composition was characterized by scanning electron microscope energy spectrometer,the results were abnormal.The causes of abnormal phenomenon was analyzed by atomic force microscope(AFM)and Monte Carlo Simulation software.The results show that the characteristic X-ray energy of element O is Kα=0.525 keV,the low energy level was difficult to penetrate the Ag coating with thickness of 400 nm.The characteristic X-ray energy of element Si is Kα=1.74 keV,Kβ=1.838 keV,the higher energy level can penetrate the thickness of Ag coating.
作者
高学平
张爱敏
GAO Xueping;ZHANG Aimin(Testing and Manufacturing Center for Advanced Materials,School of Materials Science and Engineering,Shandong University,Jinan 250061,China)
出处
《理化检验（物理分册）》
CAS
2020年第8期13-15,共3页
Physical Testing and Chemical Analysis(Part A:Physical Testing)
关键词
银涂层
能谱仪
原子力显微镜
蒙特卡洛模拟
Ag coating
energy spectrometer
atomic force microscope
Monte Carlo Simulation
作者简介
高学平(1980-),男,高级工程师,主要从事材料结构表征与失效分析工作;通信作者:张爱敏(1983-),女,高级工程师,主要从事材料结构表征与失效分析工作,zhangam@sdu.edu.cn。
