摘要
We develop a source and mask co-optimization framework incorporating the minimization of edge placement error(EPE)and process variability band(PV Band)into the cost function to compensate simultaneously for the image distortion and the increasingly pronounced lithographic process conditions.Explicit differentiable functions of the EPE and the PV Band are presented,and adaptive gradient methods are applied to break symmetry to escape suboptimal local minima.Dependence on the initial mask conditions is also investigated.Simulation results demonstrate the efficacy of the proposed source and mask optimization approach in pattern fidelity improvement,process robustness enhancement,and almost unaffected performance with random initial masks.
We develop a source and mask co-optimization framework incorporating the minimization of edge placement error(EPE) and process variability band(PV Band) into the cost function to compensate simultaneously for the image distortion and the increasingly pronounced lithographic process conditions. Explicit differentiable functions of the EPE and the PV Band are presented, and adaptive gradient methods are applied to break symmetry to escape suboptimal local minima. Dependence on the initial mask conditions is also investigated. Simulation results demonstrate the efficacy of the proposed source and mask optimization approach in pattern fidelity improvement, process robustness enhancement, and almost unaffected performance with random initial masks.
作者
Yijiang Shen
Fei Peng
Xiaoyan Huang
Zhenrong Zhang
沈逸江;彭飞;黄小燕;张振荣(School of Automation,Guangdong University of Technology,Mega Education Center South,Guangzhou 510006,China;Guangxi Key Laboratory of Multimedia Communications and Network Technology,School of Computer,Electronics and Information,Guangxi University,Nanning 530004,China)
基金
partially supported by the National Natural Science Foundation of China(No.61875041)
the Natural Science Foundation of Guangdong Province(No.2016A030313709)
the Guangxi Science Foundation(Nos.2013GXNSFCA019019 and2017GXNSFAA198227)
作者简介
通讯作者:沈逸江,yjshen@gdut.edu.cn。
