摘要
The adsorption and film forming behavior of vinyltriethoxysilane(VS) on Q235 low carbon steel surfaces, as well as its effect on the properties of film layer were systematically investigated by reflection absorption infrared spectrum(RA-IR), electrochemical impedance spectroscopy(EIS) and contact angle measurement technology. The experimental results indicate that the oscillatory phenomenon exists in the adsorption of VS on low carbon steel surfaces, which directly determines the adsorption morphology and the arrangement pattern of VS on metal surfaces, generating VS films with different protective properties. The desorption occurring in the initial stage was accompanied with film restructuring, which was helpful to the readsorption of VS and the film formation with dense structure and excellent protective performance.
The adsorption and film forming behavior of vinyltriethoxysilane(VS) on Q235 low carbon steel surfaces, as well as its effect on the properties of film layer were systematically investigated by reflection absorption infrared spectrum(RA-IR), electrochemical impedance spectroscopy(EIS) and contact angle measurement technology. The experimental results indicate that the oscillatory phenomenon exists in the adsorption of VS on low carbon steel surfaces, which directly determines the adsorption morphology and the arrangement pattern of VS on metal surfaces, generating VS films with different protective properties. The desorption occurring in the initial stage was accompanied with film restructuring, which was helpful to the readsorption of VS and the film formation with dense structure and excellent protective performance.
基金
Funded by the Research Project of Guangxi Power Grid Co.,Ltd(No.GXKJXM20160322)
作者简介
BIAN Meihua(边美华):Senior Enginccr;E-mail:bian_mh.sy@gx.csg.cn.
