摘要
合成了复合光催化剂PI/NiO/g-C_3N_4,并进行了扫描电镜(SEM)、X射线衍射(XRD)和傅里叶变换红外光谱(FT-IR)等表征。通过在紫外-可见光下降解甲基橙染料,研究了其光催化活性及反应机理。在染料浓度为20 mg/L、催化剂用量为1 g/L、光照时间15 min时,15%PI/NiO/g-C_3N_4光催化剂对甲基橙染料的降解率达到97.6%。循环实验表明,经过3次循环后,降解率略有下降,说明复合光催化剂具有较高的光催化稳定性。自由基捕获实验表明,光催化降解过程中主要的活性物种为超氧阴离子自由基(·O_2^-),同时羟基自由基(·OH)和光生空穴(h+)也参与了光催化活动。
The PI/NiO/g-C3N4 composite photocatalyst is prepared and characterized by scanning electron micro- scope （ SEM）, X-ray diffraction （ XRD）, Fourier transform infrared spectroscopy （FT-IR） and others. The photocat- alytic activity and reaction mechanism of PI/NiO/g-C3 N4 are studied via the photocatalytic degradation of methyl or- ange（MO） dye under the UV-visible light irradiation. When the photocatalyst dosage is 1 g/L, the dye concentration is 20 rag/L, and 97.6 % of degradation rate is attained under UV-visible light irradiation for 15 rain in the presence of 15 % PI/NiO/g-C3 N4. The recycling experiments show that the degradation rate has been slightly decreased after three cycles,indicating that PI/NiO/g-C3N4 has higher photocatalytic stability. The active species trapping experi- ments find that the main active species in the photocatalytic process is superoxide anion radicals （ .O2- ） ,and the hydroxyl radical （ . OH） and photoinduced holes （h ＋ ） have also participated in the photocatalytic process.
作者
朱世侦
王清
毛洁
周娅芬
ZHU Shizhen;WANG Qing;MAO Jie;ZHOU Yafen(a.College of Chemistry and Chemical Engineering,b.Key Laboratory of Chemical Synthesis and Pollution Control of Siehuan Province,China West Normal University,Nanehong Siehuan 637009,China)
出处
《西华师范大学学报（自然科学版）》
2018年第3期241-246,共6页
Journal of China West Normal University(Natural Sciences)
基金
四川省化学合成与污染控制重点实验室开放项目(CSPC2013-1)
西华师范大学英才科研基金项目(17YC041)
作者简介
朱世侦（1994-），女，重庆奉节人，硕士研究生，主要从事材料化学方面研究。;通信作者：周娅芬（1971-），女，四川眉山人，教授，博士，主要从事材料化学方面研究。E-mail：cwnuzyf@163．com
