摘要
利用直流磁控溅射技术,在锆合金基体表面上研究不同基体温度对沉积TiN薄膜的影响.分别采用X射线衍射仪和扫描电子显微镜(SEM)对TiN薄膜结构、表面形貌和截面形貌进行了研究.研究结果表明:TiN薄膜在不同沉积温度下晶格取向是不同的;200℃时,TiN为随机取向;300℃时,TiN薄膜以(111)为择优取向;400℃时,薄膜晶化质量不断提高,最后逐渐趋于稳定.300℃时,薄膜的致密性与均匀性较好,表面无明显缺陷.
The effects of different substrate temperatures on the TiN thin films were investigated on the surface of zirconium alloy by DC magnetron sputtering. The structure,surface morphology and cross-sectional morphology of TiN films were studied by X-ray diffraction and scanning electron microscopy（ SEM）. The results show that the lattice orientation of TiN thin films is different at different deposition temperatures. At 200 ℃,the orientationwere random; At 300 ℃,the（ 111） plane is the preferred one; At 400 ℃,the crystallization quality of the thin film increases firstly and then becomes stable.At 300 ℃,TiN thin film was more compact and uniform.
出处
《南华大学学报（自然科学版）》
2017年第4期86-89,共4页
Journal of University of South China：Science and Technology
基金
核设施退役和核泄漏安全处理技术及装备研发(02072012KIT01)
关键词
磁控溅射
锆合金
氮化钛
沉积温度
magnetron sputtering
Zircaloy
TiN
deposition temperature
作者简介
肖畅飞（1991-）,男,硕士研究生,主要从事机械工程方向的研究.E-mail：1225992322@qq.com.;通讯作者：邹树梁,E-mail：zousl2013@126.com
