摘要
石墨烯和类石墨烯二维半导体材料因其独特的物理化学性质受到研究人员的广泛关注,将二者结合组成的石墨烯基二维垂直异质结近年来备受研究者的青睐.本文简要介绍了石墨烯基二维垂直异质结的基本概念和性质,综述了石墨烯基二维垂直异质结制备技术的最新进展情况,对比分析了不同制备方法各自的优缺点,总结了石墨烯基二维垂直异质结在光电子学器件应用的最新进展.最后对石墨烯基二维垂直异质结的研究和发展方向做了展望.
Graphene and graphene-like two-dimensional materials have attracted extensive attention due to their unique physical and chemical properties. The graphene based two-dimensional vertical heterostructures fabricated by combining the graphene and graphene-like two-dimensional materials are highly favored by researchers. The basic conception and properties of graphene based two-dimensional heterostructures are introduced. This paper reviews the synthesis method with contrasting the merits and demerits of different methods. The applications in photoelectronics of garphene based two-dimensional heterostructures are reviewed. Subsequently, the paper makes a summary and outlook for the research and development direction of graphene based two-dimensional heterostructures.
出处
《材料科学与工艺》
EI
CAS
CSCD
北大核心
2017年第3期1-12,共12页
Materials Science and Technology
基金
国家自然科学基金资助项目(61390502
21373068
51521003)
机器人国家重点实验室重点课题(SKLRS201607B)
关键词
石墨烯
二维材料
异质结
光电子
graphene
two-dimensional materials
heterostructures
photoelectronic
作者简介
戴明金(1991-),男,博士研究生;
胡平安(1972-),男,教授,博士生导师.E—mail:hupa@hit.edu.cn