摘要
制备参数对类金刚石(DLC)薄膜的性能和结构有显著影响。利用中频脉冲非平衡磁控溅射新技术制备了DLC薄膜,采用Raman光谱、X射线光电子能谱仪、纳米压痕仪、光谱型椭偏仪研究了溅射电压对DLC薄膜微观结构、力学性能和光学性能的影响。结果表明:当溅射电压由550 V增加到750 V时,DLC薄膜中sp3杂化碳含量随溅射电压的增加而增加,当溅射电压超过750 V时,薄膜中sp3杂化碳含量随溅射电压的增加而减少;DLC薄膜的纳米硬度、折射率均随溅射电压的增加先增加而后减小,溅射电压为750 V时制备薄膜的纳米硬度及折射率最大。
Diamond-like carbon( DLC) films were produced by middle-frequency pulsed unbalanced magnetron sputtering technique. The effects of sputtering voltage on the microstructure,mechanical and optical properties of the DLC films were investigated. The chemical bonding of carbon was characterized by Raman spectroscopy and X- ray photoelectron spectroscopy( XPS).Nanohardness and refractive index for these films under different sputtering voltage were analyzed by a nano-indentation technique and spectroscopic ellipsometry tests. Results showed that the sp3 fraction in DLC films was increased with increasing sputtering voltage from 550 V to 750 V,and then decreased beyond 750 V.Besides,nanohardness and refractive index were also increased with the increasing sputtering voltage from 550 V to 750 V,and then decreased with further increasing sputtering voltage from 750 V to 850 V. When the sputtering voltage was 750 V,nanohardness and refractive index of the films had the maximum values,respectively.
出处
《材料保护》
CAS
CSCD
北大核心
2015年第12期16-19,7,共4页
Materials Protection
基金
国家自然科学基金项目(11305142)资助
关键词
类金刚石膜
中频脉冲非平衡磁控溅射
溅射电压
膜结构
膜性能
diamond-like carbon films
pulsed unbalanced magnetron sputtering
sputtering voltage
structure
properties
作者简介
[通信作者]代海洋（1982-），博士，副教授，研究方向为功能材料及器件，E—mail：haiyangdai@163．com
