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脉冲激光沉积功能薄膜的研究进展 被引量:13

Development of Function Films Prepared by Pulsed Laser Deposition Technology
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摘要 脉冲激光沉积技术是制备先进光学薄膜与纳米光学器件的重要手段和前沿领域,是国际研究的热点。介绍了脉冲激光沉积技术原理与特点、制备功能薄膜的研究现状和发展动向,着重阐述了双激光沉积制备功能薄膜的研究现状与未来发展;同时基于更高的需求,针对脉冲激光沉积技术的特点,设计构建了结合动能粒子磁过滤技术的激光沉积系统,提出了融合原子层沉积技术的发展思想,为提高激光沉积功能薄膜性能提供了硬件支撑和技术指导。 Pulsed laser deposition technology, which is considered to be one of the best method for preparing function films, has the large development potential and broad application. It′s indicated that: mostly all the films could be prepared by pulsed laser deposition technology; most of pulsed laser depositions are carried out by excimer laser with the wavelength of 248 nm whose photon energy is high, and most of films are prepared by single laser in the gas and heater condition; the films prepared by pulsed laser deposition are amorphous or polycrystalline, and a few of single crystal films are prepared just in the condition of very high temperature and vacuum. On the base of the characteristics of this technology, the pulsed laser deposition system with magnetic filter technology is designed and founded to supply the technology and hardware base for improving the performances of function films prepared by pulsed laser deposition.
出处 《激光与光电子学进展》 CSCD 北大核心 2015年第12期9-18,共10页 Laser & Optoelectronics Progress
关键词 激光技术 脉冲激光沉积 功能薄膜 超短脉冲激光 双激光 磁过滤技术 laser technique pulsed laser deposition function films ultra-short pulse double laser beams magnetic filter technology
作者简介 程勇(196l-),男,博士,教授,主要从事全固态激光器与激光沉积功能薄膜等方面的研究。Email:gdyjs@263.net;luyimin_zy@163.com
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