摘要
采用微波等离子体化学气相沉积法,以玻璃作为基底,通入CH4和H2,在改变沉积气压的条件下研究类金刚石(DLC)薄膜的生长情况。再利用紫外–可见–近红外分光光度计、激光Raman光谱仪和场发射扫描电子显微镜分别对制备出的DLC薄膜的光透过率、质量以及表面形貌进行表征与分析。结果表明:随着沉积气压的逐渐增大,可见光范围内的光透过率随之增大,类金刚石粒径逐渐减小,膜表面的团聚体尺寸逐渐减小、平整度提高。
Diamond‐like carbon films were deposited by microwave plasma chemical vapor deposition （ M PCVD） method with glass as the base . Grow th of film was observed under different depositing pressure when ventilating with CH4 and H2 . The light transmittance , the qualities , and surface morphologies were characterized by photometer , Raman spectroscopy and field emission scanning electron microscopy . The results showed that as the deposition pressure increased gradually , visible light transmittance increased step by step , and the size of grain was decreased . In addition , diamond‐like carbon aggregates were smaller and surface roughness became better .
出处
《金刚石与磨料磨具工程》
CAS
2015年第5期5-8,共4页
Diamond & Abrasives Engineering
基金
国家自然科学基金(No.11175137)
湖北省教育厅项目(Q20151517)
关键词
微波等离子体
化学气相沉积
类金刚石
表面形貌
microwave plasma
chemical vapor deposition
diamond-like carbon
surface topography
作者简介
周璐，女，1989年生，研究生。主要从事微博等离子体制备类金刚石薄膜的研究。E—mail：605469130@qq．com
