摘要
In order to investigate nanomechanical properties of nanostructured Ti metallic material, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM） and high-resolution transmission electron microscopy（HRTEM）. It is interesting to find that the microstructure of pure Ti films was characterized by the composite structure of amorphous-like matrix embodied with nanocrystallines, and the crystallization was improved with the increase of bias voltage. The hardness of Ti films measured by nanoindentation tests shows a linear relationship with grain sizes in the scale of 6-15 nm. However, the pure Ti films exhibit a soft tendency characterized by a smaller slope of Hall-Petch relationship. In addition, the effect of bias voltage on the growth orientation of Ti films was discussed.
为了研究纳米结构金属Ti的纳米力学性能,在偏压为0-140 V的范围内,采用磁控溅射方法制备纯钛薄膜。并采用X射线衍射仪（XRD）、扫描电子显微镜（SEM）和高分辨率透射电子显微镜（HRTEM）表征钛薄膜的显微组织。结果表明：钛薄膜呈现非晶与纳米晶的混合结构,且晶化程度随着偏压的升高而增大。纳米压痕测试结果表明：钛薄膜的硬度与晶粒尺寸在6-15 nm的范围内符合Hall-Petch关系。但其Hall-Petch关系的斜率与采用其他强烈塑性变形法制备的超细晶纯钛相比,明显偏小,且呈现软化趋势。此外,讨论偏压对钛薄膜生长取向的影响。
基金
Projects(51102264,51271123)supported by the National Natural Science Foundation of China
Projects(5313310202,13ZR1427900)supported by Shanghai Municipal Education Commission,China
作者简介
Corresponding author： Ai-ying CHEN; Tel： ＋86-21-55271708; Fax： ＋86-21-55270632; E-mail： aychen@usst.edu.cn
