摘要
鉴于真空镀膜机中 ,非平衡磁场控制溅射系统的“遮以阴影”弊端 ,提出一种对该系统加以完善的原理和设计方案 ,为增加等离子体的范围和密度 。
For solving the shadow problem in unbalanced magnetic field control system of vacuum plating machine, a more consummate principle was proposed which is used to increase the density and range of plasma and improve the structure and properties of plating, and its design was given and implemented in this paper.
出处
《纺织高校基础科学学报》
CAS
2002年第1期27-30,共4页
Basic Sciences Journal of Textile Universities
