摘要
采用双离子溅射的方法,在硅、石英基底上制备了单层Ta2O5、SiO2及双层Ta2O5/SiO2光学薄膜。结合Cauchy色散模型,利用石英基底上单层Ta2O5及双层Ta2O5/SiO2薄膜透射光谱曲线,采用改进的遗传单纯形混合算法,获得了Ta2O5和SiO2薄膜材料在400-700nm波段的光学常数。结果表明,理论分析值与实验测量值取得了很好的一致性,拟合出的单层Ta2O5薄膜折射率误差小于0.001,膜层厚度误差不超过1nm;双层Ta2O5/SiO2薄膜最大折射率误差小于0.004,最大厚度误差小于2.5nm。此外,还对400℃高温环境下双层Ta2O5/SiO2薄膜的微观结构、应力、表面形貌及光学性能变化进行了研究。
Single Ta2O5 and double layer Ta2O3/Si02 films are deposited on Si and fused silica substrates by dual-ion-beam sputtering. With the Cauchy dispersion model, the optical constants of Ta2O5 and SiO2 thin films are obtained byfitting the transmission spectra of single Ta2O5 and double layer Ta2O5/SiO2 films using the combination of simplexand genetic algorithm （GA） optimization method. It shows that the results calculated by fitting the whole opticalspectra are well consistent with the measuring values. The refractive index error and thickness error of single layerTa2O5 film are less than 0. 001 nm and 1 nm, respectively. In the case of double layer Ta2O5/SiO2 films, themaximum refractive index error and thickness error are in the range of 0. 004 nm and 2. 5 nm, respectively. Inaddition, the deposited double layer Ta2O5/SiO2 thin films are treated at 400 ℃ in air. The changes ofmicrostructure, surface morphology and optical properties of the Ta2O5/SiO2 films are investigated.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2014年第5期298-304,共7页
Acta Optica Sinica
作者简介
尚鹏（1986-），男，博士研究生，主要从事光学薄膜制备及性能等方面的研究。E—mail：shangpeng@163.com
导师：熊胜明（1964-），男，研究员，博士生导师，主要从事薄膜技术、激光薄膜的性质及损伤等方面的研究。E-mail：xsiil@ioe．ac．cn
