摘要
采用射频磁控溅射制备不同W含量的CrSiWN薄膜。利用X射线衍射、扫描电镜、能量散射谱、纳米压痕仪和摩擦磨损实验机对薄膜的相结构、形貌、成分和摩擦性能进行分析。结果表明,CrSiWN薄膜为fcc结构,具有(111)择优取向,薄膜主要为W固溶在CrSiN薄膜中的置换固溶体。随W含量的升高,薄膜晶格常数及晶粒尺寸逐渐增大,抵抗塑性变形能力(H3/E2)逐渐降低。由于固溶强化和晶粒增大的共同作用,薄膜显微硬度随W含量的增加先升高后降低。由于薄膜抵抗塑性变形能力随W含量逐渐降低,导致薄膜平均摩擦系数逐渐增高。当W含量为13.20%时,薄膜综合性能最优。
The CrSiWN coatings were deposited by multi-target magnetron sputtering on substrates of Si wafer and stainless steel. The impacts of the deposition conditions,including the W-content,sputtering power,and substrate temperature,on microstructures and mechanical properties of the CrSiWN coating were evaluated to optimize the surface modification conditions. The CrSiWN coatings were characterized with X-ray diffraction,scanning electron microscopy,energy dispersive spectroscopy,and mechanical probes. The 111 preferentially oriented,fcc-phased CrSiWN coatings formed via the solid solution,with W as the substitute impurity. The results show the W-content（ at） significantly affects the mechanical properties. For example,as the W-content increased,the lattice constants and grain sizes increased; the elastic modulus of the coatings decreased,and the surface micro-hardness changed in an increase-decrease mode,and the average friction coefficient increased. The optimized W content was found to be 13. 20%.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2013年第11期1128-1132,共5页
Chinese Journal of Vacuum Science and Technology
关键词
射频磁控溅射
CrSiWN薄膜
微观组织
力学性能
摩擦性能
RF reactive magnetron sputtering
CrSiWN coatings
Microstructure
Mechanical properties
Friction property
作者简介
联系人：Tel：（0511）84411035；E-mail：jhxu@just．edu．cn
